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New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography

[+] Author Affiliations
Chun-Hung Liu

National Taiwan University, Department of Electrical Engineering, No. 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan

Hoi-Tou Ng

National Taiwan University, Department of Electrical Engineering, No. 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan

Kuen-Yu Tsai

National Taiwan University, Department of Electrical Engineering, No. 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan

J. Micro/Nanolith. MEMS MOEMS. 11(1), 013009 (Mar 13, 2012). doi:10.1117/1.JMM.11.1.013009
History: Received April 27, 2011; Revised November 22, 2011; Accepted January 11, 2012
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Abstract.  Electron-beam-direct-write lithography has been considered a candidate next-generation technique for achieving high resolution. An accurate point spread function (PSF) is essential for reliable patterning prediction and proximity-effects correction. It can be derived via an effective parametric PSF calibration methodology, typically involving the fitting of the absorbed energy distribution (AED) from an electron-scattering simulation. However, the existing parametric PSF calibration methodology does not employ a systematic approach to obtain a new PSF form that is both compact and accurate when conventional PSF forms are not satisfactory. Only the AED fitting quality (rather than its patterning-prediction quality) is considered during the conventional calibration methodology. It also lacks a process to consider whether the predicted deviation (as simulated using the chosen PSF form) is satisfactory. This paper proposes a new parametric PSF calibration methodology to systematically obtain a PSF form consisting of the smallest number of terms, with a better combination of basis functions and that optimizes pattern accuracy. The effectiveness of using the new methodology is demonstrated in terms of fitting accuracy, patterning-prediction accuracy, and patterning sensitivity.

© 2012 Society of Photo-Optical Instrumentation Engineers

Citation

Chun-Hung Liu ; Hoi-Tou Ng and Kuen-Yu Tsai
"New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography", J. Micro/Nanolith. MEMS MOEMS. 11(1), 013009 (Mar 13, 2012). ; http://dx.doi.org/10.1117/1.JMM.11.1.013009


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