Special Section on Directed Self-Assembly

Frequency multiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern

[+] Author Affiliations
Roel Gronheid, Ivan Pollentier

IMEC, Kapeldreef 75, B-3001 Leuven, Belgium

Paulina A. Rincon Delgadillo

IMEC, Kapeldreef 75, B-3001 Leuven, Belgium

University of Wisconsin at Madison, Department of Biological Engineering and Center for Nanotechnology, Madison, Wisconsin 53706

Todd R. Younkin

Intel Corporation, Components Research, RA3-252, 5200 NE Elam Young Parkway, Hillsboro, Oregon 97124

Mark Somervell, Joshua S. Hooge

Tokyo Electron America, Inc., 2400 Grove Boulevard, Austin, Texas 78741

Kathleen Nafus

Tokyo Electron Kyushu Ltd., Fukuhara, Koshi-shi, Kumamoto 861-1116, Japan

Paul F. Nealey

University of Wisconsin at Madison, Department of Biological Engineering and Center for Nanotechnology, Madison, Wisconsin 53706

J. Micro/Nanolith. MEMS MOEMS. 11(3), 031303 (Jul 10, 2012). doi:10.1117/1.JMM.11.3.031303
History: Received November 18, 2011; Revised April 25, 2012; Accepted May 11, 2012
Text Size: A A A

Abstract.  The optimization of a grapho-epitaxy process flow for lamellar phase block copolymer frequency multiplication on full 300 mm wafers is discussed. The process uses a dedicated photoresist that, after hardening, allows direct coating and annealing of the block copolymer over it. Some of the critical parameters for optimization of this process were found to be the selection of the neutral layer material and reduction of the prepattern resist height. Process window analysis was done by determining the best dose and focus settings for generating high quality directed self-assembly structures with the prepattern process. A very small process window for good self-assembly and an offset in the optimum dose and focus settings for these two stages of the process were found. Finally, the sensitivity of the process to programmed prepattern imperfections was studied. Programmed protrusions in the prepattern as small as 6 nm were found to cause self-assembly defects.

Figures in this Article
© 2012 Society of Photo-Optical Instrumentation Engineers

Topics

Epitaxy

Citation

Roel Gronheid ; Paulina A. Rincon Delgadillo ; Todd R. Younkin ; Ivan Pollentier ; Mark Somervell, et al.
"Frequency multiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern", J. Micro/Nanolith. MEMS MOEMS. 11(3), 031303 (Jul 10, 2012). ; http://dx.doi.org/10.1117/1.JMM.11.3.031303


Tables

Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Journal Articles

Related Book Chapters

Topic Collections

PubMed Articles
Advertisement


 

  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.