Special Section on EUV Sources for Lithography

Extreme-ultraviolet light source development to enable pre-production mask inspection

[+] Author Affiliations
Matthew J. Partlow

Energetiq Technology, Inc., 7 Constitution Way, Woburn, Massachusetts 01801

Matthew M. Besen, Paul A. Blackborow, Ron Collins, Deborah Gustafson, Stephen F. Horne, Donald K. Smith

Energetiq Technology, Inc., 7 Constitution Way, Woburn, Massachusetts 01801

J. Micro/Nanolith. MEMS MOEMS. 11(2), 021105 (May 21, 2012). doi:10.1117/1.JMM.11.2.021105
History: Received August 1, 2011; Revised November 7, 2011; Accepted January 13, 2012
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Abstract.  As extreme-ultraviolet (EUV) lithography moves into pre-production, the requirement for commercially available mask metrology tools becomes more urgent. A key to developing a successful tool is a reliable, high-brightness EUV light source. The Energetiq EQ-10 is a commercially available EUV light source, with an installed base of over 15 sources in the field. The source relies on an electrodeless Z-pinch™ to produce greater than 10Watts/2π of 13.5 nm 2% bandwidth light. In order to meet brightness and stability requirements of mask metrology tools, we have investigated modifications to the original design of the EQ-10. The result of these modifications has roughly doubled the source output power, and has achieved brightness greater than 8Watts/mm2/sr, without sacrificing the spatial and pulse-to-pulse stability of the original design. This level of performance is sufficient for initial mask blank and imaging inspection tools.

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© 2012 Society of Photo-Optical Instrumentation Engineers

Citation

Matthew J. Partlow ; Matthew M. Besen ; Paul A. Blackborow ; Ron Collins ; Deborah Gustafson, et al.
"Extreme-ultraviolet light source development to enable pre-production mask inspection", J. Micro/Nanolith. MEMS MOEMS. 11(2), 021105 (May 21, 2012). ; http://dx.doi.org/10.1117/1.JMM.11.2.021105


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