Extreme-ultraviolet light source development to enable pre-production mask inspection

Matthew Partlow; Matthew Besen; Paul Blackborow; Ron Collins; Deborah Gustafson; Stephen Horne; Donald Smith

doi:10.1117/1.JMM.11.2.021105

21 May 2012 Extreme-ultraviolet light source development to enable pre-production mask inspection

Matthew Partlow, Matthew Besen, Paul Blackborow, Ron Collins, Deborah Gustafson, Stephen Horne, Donald Smith

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 11, Issue 2, 021105 (May 2012). https://doi.org/10.1117/1.JMM.11.2.021105

Abstract

As extreme-ultraviolet (EUV) lithography moves into pre-production, the requirement for commercially available mask metrology tools becomes more urgent. A key to developing a successful tool is a reliable, high-brightness EUV light source. The Energetiq EQ-10 is a commercially available EUV light source, with an installed base of over 15 sources in the field. The source relies on an electrodeless Z-pinch™ to produce greater than 10 Watts/2Π of 13.5 nm 2% bandwidth light. In order to meet brightness and stability requirements of mask metrology tools, we have investigated modifications to the original design of the EQ-10. The result of these modifications has roughly doubled the source output power, and has achieved brightness greater than 8 Watts/mm²/sr, without sacrificing the spatial and pulse-to-pulse stability of the original design. This level of performance is sufficient for initial mask blank and imaging inspection tools.

Citation Download Citation

Matthew Partlow, Matthew Besen, Paul Blackborow, Ron Collins, Deborah Gustafson, Stephen Horne, and Donald Smith "Extreme-ultraviolet light source development to enable pre-production mask inspection," Journal of Micro/Nanolithography, MEMS, and MOEMS 11(2), 021105 (21 May 2012). https://doi.org/10.1117/1.JMM.11.2.021105

Published: 21 May 2012

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