Special Section on EUV Sources for Lithography

Laser-produced plasma light source for extreme-ultraviolet lithography applications

[+] Author Affiliations
Reza S. Abhari

Swiss Federal Institute of Technology Zurich, Laboratory for Energy Conversion, Sonneggstrasse 3, 8092 Zurich, Switzerland

Bob Rollinger

Swiss Federal Institute of Technology Zurich, Laboratory for Energy Conversion, Sonneggstrasse 3, 8092 Zurich, Switzerland

Andrea Z. Giovannini

Swiss Federal Institute of Technology Zurich, Laboratory for Energy Conversion, Sonneggstrasse 3, 8092 Zurich, Switzerland

Oran Morris

Swiss Federal Institute of Technology Zurich, Laboratory for Energy Conversion, Sonneggstrasse 3, 8092 Zurich, Switzerland

Ian Henderson

Swiss Federal Institute of Technology Zurich, Laboratory for Energy Conversion, Sonneggstrasse 3, 8092 Zurich, Switzerland

Samir S. Ellwi

Adlyte Corporation, Industriestrasse 76300 Zug, Switzerland

J. Micro/Nanolith. MEMS MOEMS. 11(2), 021114 (Jun 11, 2012). doi:10.1117/1.JMM.11.2.021114
History: Received August 8, 2011; Revised December 3, 2011; Accepted January 12, 2012
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Abstract.  High-brightness extreme-ultraviolet light sources are required for mask inspections and metrology, including mask blank inspection, actinic pattern inspection, and aerial image measurement system to improve yield and lower cost of ownership. Laser-produced plasma (LPP) light sources have the highest potential to achieve the brightness requirements for all the range of mask inspection tools currently foreseen. High brightness of LPP sources (100 to 1000W/mm2sr) is the result of a smaller source size (0.1mm) than that of competing technologies. Since brightness is inversely proportional to the area of the source, smaller source size corresponds with greater brightness and hence greater inspection throughput.

Abstract.  At the Laboratory for Energy Conversion of ETH Zurich, a fully operational continuous-running multi-kHz LPP light source has been developed over the last five years and is now undergoing system optimization. Adlyte, a spin-off of ETH Zurich, is working with industry leaders to commercialize this LPP source. Individual subsystem configuration and the physical boundary conditions and limitations that affect power, brightness, stability, and lifetime management are discussed. This integrated system produces a measured brightness of 259W/mm2sr. Outlook for the future growth and integration of the source in high-volume manufacturing tools is then discussed.

© 2012 Society of Photo-Optical Instrumentation Engineers

Citation

Reza S. Abhari ; Bob Rollinger ; Andrea Z. Giovannini ; Oran Morris ; Ian Henderson, et al.
"Laser-produced plasma light source for extreme-ultraviolet lithography applications", J. Micro/Nanolith. MEMS MOEMS. 11(2), 021114 (Jun 11, 2012). ; http://dx.doi.org/10.1117/1.JMM.11.2.021114


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