Special Section on EUV Sources for Lithography

Free-standing spectral purity filters for extreme ultraviolet lithography

[+] Author Affiliations
Nikolay I. Chkhalo, Mikhail N. Drozdov, Evgeny B. Kluenkov, Aleksei Ya. Lopatin, Valerii I. Luchin, Nikolay N. Salashchenko, Nikolay N. Tsybin

Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhny Novgorod, Russia

Leonid A. Sjmaenok

PhysTeX, Vaals, Netherlands

Vadim E. Banine, Andrei M. Yakunin

ASML, Veldhoven, Netherlands

J. Micro/Nanolith. MEMS MOEMS. 11(2), 021115 (May 31, 2012). doi:10.1117/1.JMM.11.2.021115
History: Received August 12, 2011; Revised January 3, 2012; Accepted February 16, 2012
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Abstract.  Free-standing multilayer films consisting of Si, Zr, Mo and silicides of both metals have been fabricated and studied as spectral purity filters (SPF) for extreme ultraviolet (EUV) (13.5 nm) lithography tools. Comparative tests of multilayer SPF structures of various compositions have been performed at high power loads. It was found that a Mo/ZrSi2 structure with MoSi2 capping layers is featured with capability to withstand prolonged heating in vacuum (107mbar) at 900–950°C. A technique of fabrication of large aperture free-standing multilayers was developed, and a pilot sample of the above film structure of 160 mm in diameter, 50 nm thick, with transparency at 13.5 nm above 70% was fabricated as a conceptual prototype of SPFs with large dimensions.

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© 2012 Society of Photo-Optical Instrumentation Engineers

Citation

Nikolay I. Chkhalo ; Mikhail N. Drozdov ; Evgeny B. Kluenkov ; Aleksei Ya. Lopatin ; Valerii I. Luchin, et al.
"Free-standing spectral purity filters for extreme ultraviolet lithography", J. Micro/Nanolith. MEMS MOEMS. 11(2), 021115 (May 31, 2012). ; http://dx.doi.org/10.1117/1.JMM.11.2.021115


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