Special Section on EUV Sources for Lithography

Tabletop storage ring MIRRORCLE extreme ultraviolet lithography source

[+] Author Affiliations
Hironari Yamada, Dorian Minkov, Taichi Hayashi, Daisuke Hasegawa

Photon Production Co. Ltd., 1-1-1 Nojihigashi, Kusatsu, Shiga 525-8577, Japan

J. Micro/Nanolith. MEMS MOEMS. 11(2), 021121 (May 29, 2012). doi:10.1117/1.JMM.11.2.021121
History: Received August 3, 2011; Revised December 24, 2011; Accepted January 10, 2012
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Abstract.  Advances of tabletop electron storage rings for generating a brilliant extreme ultraviolet (EUV) or soft x-ray beam are discussed. An electron storage ring called MIRRORCLE-20SX currently provides a stored beam current with an average of 3 A, a 1-minute lifetime, 15 ms radiation damping time, and a beam size of about 3×3mm2. We generate EUV by a thin-film target placed in the electron orbit. Photons in the wavelength around 13.9 nm is generated by an Si thin film, and 4.3 nm by a diamond-like carbon (DLC) film placed in the circulating electron beam. It is known from previous experimental studies that the mechanism of EUV emission is a synchrotron Cherenkov radiation (SCR). The observed photon power is 14W/sr by the DLC film. We report that SCR is suitable for EUV lithography (EUVL) because the spectrum is monochromatic, the radiation angular spread is as narrow as 20×5mrad2, and the emitter size can be 0.01×3mm2. An optimized EUV source for lithography based on the tabletop synchrotron is proposed.

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© 2012 Society of Photo-Optical Instrumentation Engineers

Citation

Hironari Yamada ; Dorian Minkov ; Taichi Hayashi and Daisuke Hasegawa
"Tabletop storage ring MIRRORCLE extreme ultraviolet lithography source", J. Micro/Nanolith. MEMS MOEMS. 11(2), 021121 (May 29, 2012). ; http://dx.doi.org/10.1117/1.JMM.11.2.021121


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