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Conformal coating of poly-glycidyl methacrylate as lithographic polymer via initiated chemical vapor deposition

[+] Author Affiliations
Shinya Yoshida, Masayoshi Esashi

Tohoku University, WPI Advanced Institute for Materials Research, 6-6-01 Aramaki-Aza-Aoba, Aoba-ku, Sendai 980-8579, Japan

Tatsuya Kobayashi

Tohoku University, Graduate School of Engineering, 6-6-01 Aramaki-Aza-Aoba, Aoba-ku, Sendai 980-8579, Japan

Masafumi Kumano

Tohoku University, Micro System Integration Center (µSIC), 6-6-01 Aramaki-Aza-Aoba, Aoba-ku, Sendai 980-8579, Japan

J. Micro/Nanolith. MEMS MOEMS. 11(2), 023001 (May 14, 2012). doi:10.1117/1.JMM.11.2.023001
History: Received November 2, 2011; Revised February 14, 2012; Accepted April 2, 2012
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Abstract.  This study reports on the investigation of the potential applicability of poly-glycidyl methacrylate (PGMA) films deposited via initiated chemical vapor deposition (i-CVD) as lithographic resists in the microfabrication of non-planar structures. We investigate the appropriate deposition conditions of i-CVD required to form PGMA films with smooth surfaces. As a result, under the optimal conditions determined by us, we fabricate films with nanometer-scale flat surfaces. Subsequently, we demonstrate that i-CVD is effective for conformally coating a high-aspect-ratio Si trench with PGMA film via our deposition experiments. In our deep-ultraviolet lithography experiment, we successfully fabricate a fine 20-μm line-and-space (L/S) pattern with a height of approximately 1  μm. Furthermore, in our electron-beam (EB) lithography experiment, we define a fine 350-nm L/S pattern with a height of 120 nm. In addition, the i-CVD process can be used to form highly-sensitive EB resist films; the lowest dose amount for patterning these films is evaluated to be less than 0.01μC/cm2. Our results demonstrate that i-CVD is a potentially powerful method to conformally coat lithographic resist films on three-dimensional structures.

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© 2012 Society of Photo-Optical Instrumentation Engineers

Citation

Shinya Yoshida ; Tatsuya Kobayashi ; Masafumi Kumano and Masayoshi Esashi
"Conformal coating of poly-glycidyl methacrylate as lithographic polymer via initiated chemical vapor deposition", J. Micro/Nanolith. MEMS MOEMS. 11(2), 023001 (May 14, 2012). ; http://dx.doi.org/10.1117/1.JMM.11.2.023001


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