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Practical application of aerial image by principal component analysis to measure wavefront aberration of lithographic lens

[+] Author Affiliations
Lifeng Duan

Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Laboratory of Information Optics and Opto-Electronic Technology, Shanghai 201800, China

Graduate School of the Chinese Academy of Science, Beijing 100039, China

Shanghai Micro Electronics Equipment Co., Ltd., System Engineering Department, Shanghai 201203, China

Xiangzhao Wang

Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Laboratory of Information Optics and Opto-Electronic Technology, Shanghai 201800, China

Graduate School of the Chinese Academy of Science, Beijing 100039, China

Guanyong Yan

Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Laboratory of Information Optics and Opto-Electronic Technology, Shanghai 201800, China

Graduate School of the Chinese Academy of Science, Beijing 100039, China

Anatoly Bourov

Shanghai Micro Electronics Equipment Co., Ltd., System Engineering Department, Shanghai 201203, China

J. Micro/Nanolith. MEMS MOEMS. 11(2), 023009 (Jun 07, 2012). doi:10.1117/1.JMM.11.2.023009
History: Received January 29, 2012; Revised March 21, 2012; Accepted March 29, 2012
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Abstract.  In this paper, we propose a new method that can extract aberrations using aerial image measurements and present its experimental results on lithographic tools. Based on physical simulation and statistical analysis, a linear regression matrix is obtained establishing a connection between principal component coefficients of specific aerial images and Zernike coefficients. In the application phase, the aberrations of the projection lens are solved via the use of this regression matrix. An engineering model is established based on an extension of theoretical model that incorporates all the significant systematic errors. The performance of the engineering model as applied on a 0.75 NA ArF scanner is reported. In the experiment, measurement marks oriented in orthogonal directions are used and aerial images at 9 field points are measured. To verify the repeatability of this technique, every point is measured 20 times. By inputting the aerial images into the engineering model, Zernike coefficients are solved and the results are analyzed. The wafer exposures were performed to evaluate the results of aberration correction.

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© 2012 Society of Photo-Optical Instrumentation Engineers

Citation

Lifeng Duan ; Xiangzhao Wang ; Guanyong Yan and Anatoly Bourov
"Practical application of aerial image by principal component analysis to measure wavefront aberration of lithographic lens", J. Micro/Nanolith. MEMS MOEMS. 11(2), 023009 (Jun 07, 2012). ; http://dx.doi.org/10.1117/1.JMM.11.2.023009


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