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Design considerations for ultraviolet-nanoimprint lithography resists

[+] Author Affiliations
Kazuyuki Usuki, Satoshi Wakamatsu, Tadashi Oomatsu, Akiko Hattori, Kouji Shitabatake

FUJIFILM Corporation, R&D Management Headquarters, Frontier Core-Technology Laboratories, 577 Ushijima, Kaisei-Machi, Ashigarakami-Gun, Kanagawa 258-8577, Japan

Shinji Tarutani

FUJIFILM Corporation, R&D Management Headquarters, Electronic Materials Research Laboratories, 4000 Kawashiri, Yoshida-chou, Haibara-gun, Shizuoka 421-0396, Japan

Kunihiko Kodama

FUJIFILM Corporation, R&D Management Headquarters, Synthetic Organic Chemistry Laboratories, 210 Nakanuma, Minamiashigara-shi, Kanagawa 250-0193, Japan

Hideto Tanabe

FUJIFILM Corporation, R&D Management Headquarters, Analysis Technology Center, 2-12-1 Ougi-chou, Odawara-shi, Kanagawa 250-0001, Japan

J. Micro/Nanolith. MEMS MOEMS. 11(3), 033008 (Aug 14, 2012). doi:10.1117/1.JMM.11.3.033008
History: Received March 2, 2012; Revised June 6, 2012; Accepted July 2, 2012
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Abstract.  Design considerations for ultraviolet-nanoimprint lithography resists were investigated focusing on the major issues of ink-jetting performance, pattern formability, release property, and dry etching resistance. Regarding ink-jetting performance, small droplet ink-jetting of 0.7 pl was successfully demonstrated by adjusting the resist fluid property to the ink-jet coater and controlling the resist volatilization. Regarding pattern formability, a resist pattern was imprinted from a mold pattern of 28 nm in width and 60 nm in depth without pattern dimension change. It was thought that modulus control of the resist was more important than resist shrinkage in achieving excellent pattern formability. As for release property, resist with fluorine monomer and with nonreactive fluorine antisticking agent were compared. The results indicated that resist design has the capability to both reduce separation force and maintain a clear mold surface. The mold release agent decomposed with an increasing number of imprint shots, but the low release-force resist with nonreactive antisticking agent was able to control degradation of the mold release agent and thus improve release property endurance. Regarding etching resistance, it was found that increasing the ring parameter of resist is essential for high etching resistance, and resulted in improved etched pattern features of the substrate.

© 2012 Society of Photo-Optical Instrumentation Engineers

Citation

Kazuyuki Usuki ; Satoshi Wakamatsu ; Tadashi Oomatsu ; Akiko Hattori ; Shinji Tarutani, et al.
"Design considerations for ultraviolet-nanoimprint lithography resists", J. Micro/Nanolith. MEMS MOEMS. 11(3), 033008 (Aug 14, 2012). ; http://dx.doi.org/10.1117/1.JMM.11.3.033008


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