Special Section on Alternative Lithographic Technologies

Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography

[+] Author Affiliations
Lei Wan

HGST, a Western Digital Company, San Jose Research Center, 3403 Yerba Buena Road, San Jose, California 95135

University of Wisconsin-Madison, Department of Chemical and Biological Engineering, 1415 Engineering Drive, Madison, Wisconsin 53706

Ricardo Ruiz, He Gao, Kanaiyalal C. Patel, Jeffrey Lille, Gabriel Zeltzer, Elizabeth A. Dobisz, Alexei Bogdanov, Thomas R. Albrecht

HGST, a Western Digital Company, San Jose Research Center, 3403 Yerba Buena Road, San Jose, California 95135

Paul F. Nealey

University of Wisconsin-Madison, Department of Chemical and Biological Engineering, 1415 Engineering Drive, Madison, Wisconsin 53706

J. Micro/Nanolith. MEMS MOEMS. 11(3), 031405 (Aug 07, 2012). doi:10.1117/1.JMM.11.3.031405
History: Received April 16, 2012; Revised June 14, 2012; Accepted July 10, 2012
Text Size: A A A

Abstract.  A block copolymer-directed self-assembly was combined with nanoimprint lithography to generate templates with rectangular patterns through an original double imprint process. A rotary e-beam tool was used to separately expose circumferential and radial line/space chemical contrast patterns with periodicities commensurate to the natural period of two lamellae-forming poly(styrene-b-methyl methacrylate) (PS-b-PMMA) block copolymers. Line patterns are formed by directed self-assembly of PS-b-PMMA on chemical patterns on two separate submaster templates, one with circumferential lines to define concentric tracks, and a second template on which the block copolymer is used to form radial lines at constant angular pitch. The patterns are subsequently transferred to their underlying Si substrates to form submaster templates. Using two sequential nanoimprinting steps, the radial and circumferential submaster line patterns were combined into a final quartz master template with rectangular bits on circular tracks.

Figures in this Article
© 2012 Society of Photo-Optical Instrumentation Engineers

Citation

Lei Wan ; Ricardo Ruiz ; He Gao ; Kanaiyalal C. Patel ; Jeffrey Lille, et al.
"Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography", J. Micro/Nanolith. MEMS MOEMS. 11(3), 031405 (Aug 07, 2012). ; http://dx.doi.org/10.1117/1.JMM.11.3.031405


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