Special Section on Alternative Lithographic Technologies

Cleaning induced imprint template erosion

[+] Author Affiliations
SherJang Singh

SUSS MicroTec Inc., 430 Indio Way, Sunnyvale, California 05677

Zhaoning Yu, Nobuo Kurataka, Gene Gauzner, Hongying Wang, Henry Yang, Yautzong Hsu, Kim Lee, David Kuo

Seagate Technology, 47010 Kato Road, Fremont, California 94538

Tobias Wähler, Peter Dress

HamaTech APE GmbH, Ferdinand-von-Steinbeis-Ring 10, 75447 Sternenfels, Germany

J. Micro/Nanolith. MEMS MOEMS. 11(3), 031407 (Sep 13, 2012). doi:10.1117/1.JMM.11.3.031407
History: Received April 22, 2012; Revised June 22, 2012; Accepted July 23, 2012
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Abstract.  We studied the erosion and feature stability of fused silica patterns under different template cleaning conditions. The conventional sulfuric acid and hydrogen peroxide mixture (SPM) cleaning is compared with an advanced nonacid process. Spectroscopic ellipsometry optical critical dimension measurements were used to characterize the changes in pattern profile with good sensitivity. This study confirmed the erosion of the silica patterns in the traditional acid-based SPM cleaning mixture (H2SO4+H2O2) at a rate of 0.1nm per cleaning cycle. However, the advanced nonacid cleaning process only showed critical dimension shift of 0.01nm per cleaning. Contamination removal and pattern integrity of sensitive 20-nm features under MegaSonic assisted cleaning was also demonstrated.

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© 2012 Society of Photo-Optical Instrumentation Engineers

Citation

SherJang Singh ; Zhaoning Yu ; Tobias Wähler ; Nobuo Kurataka ; Gene Gauzner, et al.
"Cleaning induced imprint template erosion", J. Micro/Nanolith. MEMS MOEMS. 11(3), 031407 (Sep 13, 2012). ; http://dx.doi.org/10.1117/1.JMM.11.3.031407


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