Cleaning induced imprint template erosion

SherJang Singh; Zhaoning Yu; Nobuo Kurataka; Gene Gauzner; Hongying Wang; Henry H. Yang; Yautzong E. Hsu; Kim Y. Lee; David S. Kuo; Tobias Wähler; Peter Dress

doi:10.1117/1.JMM.11.3.031407

13 September 2012 Cleaning induced imprint template erosion

SherJang Singh, Zhaoning Yu, Nobuo Kurataka, Gene Gauzner, Hongying Wang, Henry H. Yang, Yautzong E. Hsu, Kim Y. Lee, David S. Kuo, Tobias Wähler, Peter Dress

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 11, Issue 3, 031407 (September 2012). https://doi.org/10.1117/1.JMM.11.3.031407

Abstract

We studied the erosion and feature stability of fused silica patterns under different template cleaning conditions. The conventional sulfuric acid and hydrogen peroxide mixture (SPM) cleaning is compared with an advanced nonacid process. Spectroscopic ellipsometry optical critical dimension measurements were used to characterize the changes in pattern profile with good sensitivity. This study confirmed the erosion of the silica patterns in the traditional acid-based SPM cleaning mixture (H₂SO₄+H₂O₂) at a rate of ~ 0.1 nm per cleaning cycle. However, the advanced nonacid cleaning process only showed critical dimension shift of ~ 0.01 nm per cleaning. Contamination removal and pattern integrity of sensitive 20-nm features under MegaSonic assisted cleaning was also demonstrated.

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SherJang Singh, Zhaoning Yu, Nobuo Kurataka, Gene Gauzner, Hongying Wang, Henry H. Yang, Yautzong E. Hsu, Kim Y. Lee, David S. Kuo, Tobias Wähler, and Peter Dress "Cleaning induced imprint template erosion," Journal of Micro/Nanolithography, MEMS, and MOEMS 11(3), 031407 (13 September 2012). https://doi.org/10.1117/1.JMM.11.3.031407

Published: 13 September 2012

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