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Analytical treatment of the deformation behavior of extreme-ultraviolet-lithography masks during electrostatic chucking

[+] Author Affiliations
Gerd Brandstetter

University of California, Berkeley, California 94720-1710

Sanjay Govindjee

University of California, Structural Engineering, Mechanics and Materials, Berkeley, California 94720-1710

J. Micro/Nanolith. MEMS MOEMS. 11(4), 043005 (Oct 12, 2012). doi:10.1117/1.JMM.11.4.043005
History: Received March 1, 2012; Accepted September 21, 2012
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Abstract.  A new analytical approach is presented to predict mask deformation during electrostatic chucking in next-generation extreme-ultraviolet-lithography. Given an arbitrary profile measurement of the mask and chuck nonflatness, this method has been developed as an alternative to time-consuming finite element simulations for overlay error correction algorithms. We consider the feature transfer of each harmonic component in the profile shapes via linear elasticity theory and demonstrate analytically how high spatial frequencies are filtered. The method is compared to presumably more accurate finite element simulations and has been tested successfully in an overlay error compensation experiment, where the residual error y-component could be reduced by a factor of 2. As a side outcome, the formulation provides a tool to estimate the critical pin-size and -pitch such that the distortion on the mask front-side remains within given tolerances. We find for a numerical example that pin-pitches of less than 5 mm will result in a mask pattern distortion of less than 1 nm if the chucking pressure is below 30 kPa.

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© 2012 Society of Photo-Optical Instrumentation Engineers

Citation

Gerd Brandstetter and Sanjay Govindjee
"Analytical treatment of the deformation behavior of extreme-ultraviolet-lithography masks during electrostatic chucking", J. Micro/Nanolith. MEMS MOEMS. 11(4), 043005 (Oct 12, 2012). ; http://dx.doi.org/10.1117/1.JMM.11.4.043005


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