Modeling the effects of pupil-manipulated spherical aberration in optical nanolithography

Monica Kempsell Sears; Bruce W. Smith

doi:10.1117/1.JMM.12.1.013008

6 February 2013 Modeling the effects of pupil-manipulated spherical aberration in optical nanolithography

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 12, Issue 1, 013008 (February 2013). https://doi.org/10.1117/1.JMM.12.1.013008

Abstract

An aerial image model is used to study the effects of spherical aberration applied in the lens pupil domain of a lithography projection scanner. These effects include the illumination dependency of focus exposure matrix tilt and the linear relationship between primary and higher order spherical coefficients on best focus (BF). Experimental data trends of BF through pitch and orientation have been replicated by an analytical expression. This computationally efficient formulation has the capability to provide corrective spherical aberration coefficients, which decrease the pitch-dependent BF and increase process latitude.

Citation Download Citation

Monica Kempsell Sears and Bruce W. Smith "Modeling the effects of pupil-manipulated spherical aberration in optical nanolithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 12(1), 013008 (6 February 2013). https://doi.org/10.1117/1.JMM.12.1.013008

Published: 6 February 2013

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