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Modeling the effects of pupil-manipulated spherical aberration in optical nanolithography

[+] Author Affiliations
Monica Kempsell Sears

Rochester Institute of Technology, 168 Lomb Memorial Drive, Rochester, New York 14623

Bruce Smith

Rochester Institute of Technology, 168 Lomb Memorial Drive, Rochester, New York 14623

J. Micro/Nanolith. MEMS MOEMS. 12(1), 013008 (Feb 06, 2013). doi:10.1117/1.JMM.12.1.013008
History: Received September 12, 2012; Revised January 9, 2013; Accepted January 21, 2013
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Abstract.  An aerial image model is used to study the effects of spherical aberration applied in the lens pupil domain of a lithography projection scanner. These effects include the illumination dependency of focus exposure matrix tilt and the linear relationship between primary and higher order spherical coefficients on best focus (BF). Experimental data trends of BF through pitch and orientation have been replicated by an analytical expression. This computationally efficient formulation has the capability to provide corrective spherical aberration coefficients, which decrease the pitch-dependent BF and increase process latitude.

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© 2013 Society of Photo-Optical Instrumentation Engineers

Citation

Monica Kempsell Sears and Bruce Smith
"Modeling the effects of pupil-manipulated spherical aberration in optical nanolithography", J. Micro/Nanolith. MEMS MOEMS. 12(1), 013008 (Feb 06, 2013). ; http://dx.doi.org/10.1117/1.JMM.12.1.013008


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