Areal electron beam lithography using a magnetic reticle

Aleksandar Aleksov; Dmitri E. Nikonov; Shawna M. Liff

doi:10.1117/1.JMM.12.1.013010

11 February 2013 Areal electron beam lithography using a magnetic reticle

Aleksandar Aleksov, Dmitri E. Nikonov, Shawna M. Liff

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 12, Issue 1, 013010 (February 2013). https://doi.org/10.1117/1.JMM.12.1.013010

Abstract

We propose an electron beam lithography system that would allow for pattern transfer from a magnetic reticle to a wafer. The reticle consists of a patterned magnetic media where magnetization of a nanomagnet stores a value of a pixel. Information stored on this media is transferred as a pattern onto the electron-resist via spin-polarized electrons photo-generated from the reticle and spin-filtered along the way to the wafer to generate contrast. It is speculated that such a system offers significantly higher throughput than a multielectron-beam lithography system and may outpace in flexibility, cost and throughput extreme ultra-violet-lithography systems that are currently being developed, while at least matching the resolution of both lithography systems.

Citation Download Citation

Aleksandar Aleksov, Dmitri E. Nikonov, and Shawna M. Liff "Areal electron beam lithography using a magnetic reticle," Journal of Micro/Nanolithography, MEMS, and MOEMS 12(1), 013010 (11 February 2013). https://doi.org/10.1117/1.JMM.12.1.013010

Published: 11 February 2013

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