Regular Articles

Scanning interference evanescent wave lithography for sub-22-nm generations

[+] Author Affiliations
Peng Xie

Rochester Institute of Technology, Microsystems Engineering, 77 Lomb Memorial Drive, Rochester, New York 14623

Bruce W. Smith

Rochester Institute of Technology, Microsystems Engineering, 77 Lomb Memorial Drive, Rochester, New York 14623

J. Micro/Nanolith. MEMS MOEMS. 12(1), 013011 (Feb 11, 2013). doi:10.1117/1.JMM.12.1.013011
History: Received November 27, 2012; Revised January 3, 2013; Accepted January 28, 2013
Text Size: A A A

Abstract.  Large field, ultra-high numerical aperture (NA) lithography is desired in semiconductor manufacturing. We report progress in developing a scanning evanescent wave lithography (s-EWL) imaging head with a two-stage gap control system including a DC noise canceling air bearing, which houses an AC noise-canceling piezoelectric actuator. Various design aspects of the system, including gap detection, prism design, optical alignment, software integration, feedback actuation, and a scanning scheme have been developed to ensure sub-100-nm gap control. Experimental results have shown successful gap gauging with a gap noise root-mean-square (RMS) of 1.38 nm in static gap control, and 4.64 nm in linear scanning gap control. Integrating the prototype imaging head into a two-beam interferometer platform has demonstrated dynamic stepping imaging using fused silica and sapphire prisms, with potential NA values up to 1.85 (26-nm half-pitch). These results achieved with s-EWL provide a possible route to extend optical lithography to 16-nm generations and beyond when combined with double patterning techniques.

© 2013 Society of Photo-Optical Instrumentation Engineers

Citation

Peng Xie and Bruce W. Smith
"Scanning interference evanescent wave lithography for sub-22-nm generations", J. Micro/Nanolith. MEMS MOEMS. 12(1), 013011 (Feb 11, 2013). ; http://dx.doi.org/10.1117/1.JMM.12.1.013011


Tables

Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.