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Characterization of e-beam patterned grating structures using Mueller matrix based scatterometry

[+] Author Affiliations
Gangadhara Raja Muthinti, Ravi K. Bonam, Alain C. Diebold

College of Nanoscale Science and Engineering, State University of New YorkAlbany, New York 12203

Brennan Peterson

Nanometrics Inc., 1550 Buckeye Dr., Milpitas, California 95035

J. Micro/Nanolith. MEMS MOEMS. 12(1), 013018 (Mar 27, 2013). doi:10.1117/1.JMM.12.1.013018
History: Received April 30, 2012; Revised February 12, 2013; Accepted March 12, 2013
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Abstract.  Scatterometry is one of the most useful metrology methods for the characterization and control of critical dimensions and the detailed feature shape of periodic structures found in the microelectronics fabrication processes. Spectroscopic ellipsometry (SE) and normal incidence reflectometry (NI)-based scatterometry are widely used optical methodologies for metrology of these structures. Evolution of improved optical hardware and faster computing capabilities led to the development of Mueller matrix (MM)-based scatterometry (MMS). Unlike SE and NI, MM data provides complete information about the optical reflection and transmission of polarized light interacting with a sample. This gives MMS an advantage over traditional SE scatterometry due to the ability to characterize samples that have anisotropic optical properties and depolarize light. In this paper, we present the study of full MM (16-element) scatterometry over a wide spectral range from 245 to 1700 nm on a series of one-dimensional, two-dimensional symmetric, and asymmetric grating structures. A series of laterally complex nanoscale structures were designed and fabricated using a state-of-the-art e-beam patterning. Spectroscopic MM and SE data were collected using a dual rotating compensator ellipsometer. Commercial modeling software based on the rigorous coupled-wave approximation was used to precisely calculate the critical dimensions. Results from MMS were compared with scanning electron microscopy.

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© 2013 Society of Photo-Optical Instrumentation Engineers

Citation

Gangadhara Raja Muthinti ; Brennan Peterson ; Ravi K. Bonam and Alain C. Diebold
"Characterization of e-beam patterned grating structures using Mueller matrix based scatterometry", J. Micro/Nanolith. MEMS MOEMS. 12(1), 013018 (Mar 27, 2013). ; http://dx.doi.org/10.1117/1.JMM.12.1.013018


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