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Model of curing shrinkage and kinetic parameters of an acrylate-based ultraviolet-embossing resist based on free volume theory

[+] Author Affiliations
Nan Liu

Harbin Institute of Technology, Center of Ultra-precision Optoelectronic Instrument, Harbin 150001, China

Soochow University, School of Mechanical and Electric Engineering, Soochow 215021, China

Jingbei Liu

Harbin Institute of Technology, Center of Ultra-precision Optoelectronic Instrument, Harbin 150001, China

Jie Lin

Harbin Institute of Technology, Center of Ultra-precision Optoelectronic Instrument, Harbin 150001, China

Graham Davies

University of New South Wales, Faculty of Engineering, Sydney NSW 2052, Australia

Peng Jin

Harbin Institute of Technology, Center of Ultra-precision Optoelectronic Instrument, Harbin 150001, China

University of New South Wales, Faculty of Engineering, Sydney NSW 2052, Australia

Dou Zhang

Central South University, State Key Laboratory of Powder Metallurgy, Changsha 410083, China

J. Micro/Nanolith. MEMS MOEMS. 12(2), 023005 (May 10, 2013). doi:10.1117/1.JMM.12.2.023005
History: Received September 2, 2012; Revised February 28, 2013; Accepted March 26, 2013
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Abstract.  Free volume theory and a model of polymerization kinetics are introduced to predict and analyze the curing shrinkage and kinetic parameters of an acrylate-based ultraviolet-embossing resist. Curing shrinkage tests have been designed and performed to verify the accuracy of the model. The experimental results are in good agreement with the simulated results of the conversion behavior. The reaction coefficients of polymerization predicted by this model are essentially correct when compared to the classical experimental values. Moreover, the dynamic shrinkage during polymerization determined experimentally matches the simulated result predicted by our model.

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© 2013 Society of Photo-Optical Instrumentation Engineers

Citation

Nan Liu ; Jingbei Liu ; Jie Lin ; Graham Davies ; Peng Jin, et al.
"Model of curing shrinkage and kinetic parameters of an acrylate-based ultraviolet-embossing resist based on free volume theory", J. Micro/Nanolith. MEMS MOEMS. 12(2), 023005 (May 10, 2013). ; http://dx.doi.org/10.1117/1.JMM.12.2.023005


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