Special Section on Alternative Lithographic Technologies

Scaling-down lithographic dimensions with block-copolymer materials: 10-nm-sized features with poly(styrene)-block-poly(methylmethacrylate)

[+] Author Affiliations
Xavier Chevalier

Arkema France, Route Nationale 117, BP34-64170 Lacq, France

CEA, LETI, MINATEC Campus, 17 rue des Martyrs, 38054 Grenoble cedex 9, France

Célia Nicolet

Arkema France, Route Nationale 117, BP34-64170 Lacq, France

Université Bordeaux I-CNRSLCPO-UMR 5629, , 33405 Talence cedex, France

Raluca Tiron, Ahmed Gharbi, Maxime Argoud, Jonathan Pradelles

CEA, LETI, MINATEC Campus, 17 rue des Martyrs, 38054 Grenoble cedex 9, France

Michael Delalande, Gilles Cunge

LTM-CNRS, CEA, LETI, 17 Rue des Martyrs, 38054 Grenoble cedex, France

Guillaume Fleury, Georges Hadziioannou

Université Bordeaux I-CNRSLCPO-UMR 5629, , 33405 Talence cedex, France

Christophe Navarro

Arkema France, Route Nationale 117, BP34-64170 Lacq, France

J. Micro/Nanolith. MEMS MOEMS. 12(3), 031102 (Aug 02, 2013). doi:10.1117/1.JMM.12.3.031102
History: Received April 9, 2013; Revised May 31, 2013; Accepted June 12, 2013
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Abstract.  Poly(styrene)-block-poly(methylmethacrylate) (PS-b-PMMA) block-copolymers (BCP) systems synthesized on an industrial scale and satisfying microelectronic’s requirements for metallic contents specifications are studied in terms of integration capabilities for lithographic applications. We demonstrate in particular that this kind of polymer can efficiently achieve periodic features close to 10 nm. These thin films can be transferred in various substrates through dry-etching techniques. The self-assembly optimization for each polymer is first performed on freesurface, leading to interesting properties, and the changes in self-assembly rules for low molecular-weight polymers are investigated and highlighted through different graphoepitaxy approaches. The improvements in self-assembly capabilities toward low periodic polymers, as well as the broad range of achievable feature sizes, make the PS-b-PMMA system very attractive for lithographic CMOS applications. We conclude by showing that high-χ polymer materials developed in Arkema’s laboratories can be efficiently used to reduce the pattern’s size beyond the ones of PS-b-PMMA based BCP’s capabilities.

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© 2013 Society of Photo-Optical Instrumentation Engineers

Citation

Xavier Chevalier ; Célia Nicolet ; Raluca Tiron ; Ahmed Gharbi ; Maxime Argoud, et al.
"Scaling-down lithographic dimensions with block-copolymer materials: 10-nm-sized features with poly(styrene)-block-poly(methylmethacrylate)", J. Micro/Nanolith. MEMS MOEMS. 12(3), 031102 (Aug 02, 2013). ; http://dx.doi.org/10.1117/1.JMM.12.3.031102


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