Special Section on Alternative Lithographic Technologies

Hard disk drive thin film head manufactured using nanoimprint lithography

[+] Author Affiliations
Daniel B. Sullivan, Thomas Boonstra, Mark T. Kief, Lily Youtt, Sethuraman Jayashankar, Carolyn Van Dorn, Harold Gentile, Sriram Viswanathan, Dexin Wang, Dion Song, Dongsung Hong, Sung-Hoon Gee

Seagate Technology, Inc., 7801 Computer Avenue South, Bloomington, Minnesota 55435

J. Micro/Nanolith. MEMS MOEMS. 12(3), 031105 (Aug 02, 2013). doi:10.1117/1.JMM.12.3.031105
History: Received May 1, 2013; Revised June 10, 2013; Accepted July 1, 2013
Text Size: A A A

Abstract.  The lithographic requirements for the thin film head (TFH) industry are comparable to the semiconductor industry for certain parameters such as resolution and pattern repeatability. In other aspects such as throughput and defectivity, the requirements tend to be more relaxed. These requirements match well with the strengths and weaknesses reported concerning nanoimprint lithography (NIL) and suggest an alternative approach to optical lithography. We demonstrate the proof of concept of using NIL patterning, in particular Jet and Flash™ Imprint Lithography (J-FIL™) (Imprio, Jet and Flash Imprint Lithography, and J-FIL trademarks are the property of Molecular Imprints, Inc.), to build functional TFH devices with performance comparable to standard wafer processing. An Imprio™ 300 tool from Molecular Imprints, Inc. (MII) was modified to process the AlTiC ceramic wafers commonly used in the TFH industry. Templates were produced using commercially viable photomask manufacturing processes and the AlTiC wafer process flow was successfully modified to support NIL processing. Future work is identified to further improve lithographic performance including residual layer thickness uniformity, wafer topography, NILNIL overlay, and development of a large imprint field that exceeds what is available in optical lithography.

© 2013 Society of Photo-Optical Instrumentation Engineers

Citation

Daniel B. Sullivan ; Thomas Boonstra ; Mark T. Kief ; Lily Youtt ; Sethuraman Jayashankar, et al.
"Hard disk drive thin film head manufactured using nanoimprint lithography", J. Micro/Nanolith. MEMS MOEMS. 12(3), 031105 (Aug 02, 2013). ; http://dx.doi.org/10.1117/1.JMM.12.3.031105


Tables

Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Journal Articles

Related Book Chapters

Topic Collections

PubMed Articles
Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.