Special Section on Alternative Lithographic Technologies

Nanolithography by scanning probes on calixarene molecular glass resist using mix-and-match lithography

[+] Author Affiliations
Marcus Kaestner, Manuel Hofer, Ivo W. Rangelow

Ilmenau University of Technology, Institute of Micro- and Nanoelectronics, Department of Micro- and Nanoelectronic Systems, Faculty of Electrical Engineering and Information Technology, P.O. Box 100565, 98684 Ilmenau, Germany

J. Micro/Nanolith. MEMS MOEMS. 12(3), 031111 (Aug 12, 2013). doi:10.1117/1.JMM.12.3.031111
History: Received April 17, 2013; Revised June 26, 2013; Accepted July 10, 2013
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Abstract.  Going “beyond the CMOS information-processing era,” taking advantage of quantum effects occurring at sub-10-nm level, requires novel device concepts and associated fabrication technologies able to produce promising features at acceptable cost levels. Herein, the challenge affecting the lithographic technologies comprises the marriage of down-scaling the device-relevant feature size towards single-nanometer resolution with a simultaneous increase of the throughput capabilities. Mix-and-match lithographic strategies are one promising path to break through this trade-off. Proof-of-concept combining electron beam lithography (EBL) with the outstanding capabilities of closed-loop electric field current-controlled scanning probe nanolithography (SPL) is demonstrated. This combination, whereby also extreme ultraviolet lithography (EUVL) is possible instead of EBL, enables more: improved patterning resolution and reproducibility in combination with excellent overlay and placement accuracy. Furthermore, the symbiosis between EBL (EUVL) and SPL expands the process window of EBL (EUVL) beyond the state of the art, allowing SPL-based pre- and post-patterning of EBL (EUVL) written features at critical dimension levels with scanning probe microscopy-based pattern overlay alignment capability. Moreover, we are able to modify the EBL (EUVL) pattern even after the development step. The ultra-high resolution mix-and-match lithography experiments are performed on the molecular glass resist calixarene using a Gaussian e-beam lithography system operating at 10 keV and a home-developed SPL setup.

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© 2013 Society of Photo-Optical Instrumentation Engineers

Citation

Marcus Kaestner ; Manuel Hofer and Ivo W. Rangelow
"Nanolithography by scanning probes on calixarene molecular glass resist using mix-and-match lithography", J. Micro/Nanolith. MEMS MOEMS. 12(3), 031111 (Aug 12, 2013). ; http://dx.doi.org/10.1117/1.JMM.12.3.031111


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