Special Section on Advanced Plasma-Etch Technology

Precuring implant photoresists for shrink and patterning control

[+] Author Affiliations
Gustaf Winroth, Erik Rosseel, Christie Delvaux, Efrain Altamirano Sanchez, Monique Ercken

IMEC vzw, Kapeldreef 75, 3001 Leuven, Belgium

J. Micro/Nanolith. MEMS MOEMS. 12(4), 041303 (Sep 05, 2013). doi:10.1117/1.JMM.12.4.041303
History: Received May 6, 2013; Revised June 29, 2013; Accepted July 31, 2013
Text Size: A A A

Abstract.  193-nm compatible photoresists are turning out to be the new platform for implant lithography, due to the increasing requirements in both resolution and overlay. Shrinkage of such resists is becoming progressively the most topical issue for aggressive nodes, where conventional pretreatments from older resist platforms, such as ultraviolet flood exposures, are not directly transferable to (meth-)acrylate-type resists. The precuring options available for state-of-the-art implant photoresists for 193-nm lithography is explored, in which we target to reduce the shrinkage during implantation for trenching critical dimensions (CDs) that are relevant for nodes <20nm. An extensive study comprising different approaches, including laser-, ion-, and electron-based treatments, is presented. Each treatment is individually investigated with the aim to find not only a valid pretreatment for shrinkage control during implantation, but also to understand what effect alternative pretreatments have on the morphology and the CDs of thick photoresists used as implant stopping layers. Viable options for further process optimization in order to integrate them into device process flows are found. To this extent, the shrink behavior after pretreatment is shown, and the additional shrink dynamics after implantation are compared.

Figures in this Article
© 2013 Society of Photo-Optical Instrumentation Engineers

Citation

Gustaf Winroth ; Erik Rosseel ; Christie Delvaux ; Efrain Altamirano Sanchez and Monique Ercken
"Precuring implant photoresists for shrink and patterning control", J. Micro/Nanolith. MEMS MOEMS. 12(4), 041303 (Sep 05, 2013). ; http://dx.doi.org/10.1117/1.JMM.12.4.041303


Tables

Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement


 

  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.