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Datapath system for multiple electron beam lithography systems using image compression

[+] Author Affiliations
Jeehong Yang

Qualcomm Technologies Inc., 5775 Morehouse Drive, San Diego, California 92121

Serap A. Savari

Texas A&M University, Department of Electrical and Computer Engineering, 3128 TAMU, College Station, Texas 77843

H. Rusty Harris

Texas A&M University, Department of Electrical and Computer Engineering, 3128 TAMU, College Station, Texas 77843

J. Micro/Nanolith. MEMS MOEMS. 12(3), 033018 (Sep 09, 2013). doi:10.1117/1.JMM.12.3.033018
History: Received June 18, 2012; Revised June 4, 2013; Accepted July 25, 2013
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Abstract.  The datapath throughput of electron beam lithography systems can be improved by applying lossless image compression to the layout images and using an electron beam writer that contains a decoding circuit packed in single silicon to decode the compressed image on-the-fly. In our past research, we had introduced Corner2, a lossless layout image compression algorithm that achieved significantly better performance in compression ratio, encoding/decoding speed, and decoder memory requirement than Block C4. However, it assumed a somewhat different writing strategy from those currently suggested by multiple electron beam (MEB) system designers. The Corner2 algorithm is modified so that it can support the writing strategy of an MEB system.

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© 2013 Society of Photo-Optical Instrumentation Engineers

Citation

Jeehong Yang ; Serap A. Savari and H. Rusty Harris
"Datapath system for multiple electron beam lithography systems using image compression", J. Micro/Nanolith. MEMS MOEMS. 12(3), 033018 (Sep 09, 2013). ; http://dx.doi.org/10.1117/1.JMM.12.3.033018


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