Over the past decades, the smallest feature size of integrated circuits has become smaller and smaller. Nowadays, it has decreased to 22 nm. During this process, surface nanopatterning has become one of the most intensively studied topics in the fields of material science and engineering. There are different nanostructuring techniques in patterning various building blocks (e.g., nanodots, nanopillars, nanorods, nanospheres) on the surface of substrates, mainly including lithographic methods,1 nanoimprinting2 and replica molding processes,3 scanning probe microscope (SPM) writing techniques,4 and template-based methods.5,6 Among these techniques, surface patterning methods using templates are highly efficient in preparing surface nanostructures. Compared to the lithographic methods including normal lithography, electron-beam lithography, even ArF immersion lithography and EUV lithography, the template-based methods are time-saving approaches with low equipment cost in fabricating large-scale ordered arrays of surface structures because they do not require any resists.