Special Section on Optical Lithography Extension Beyond the 14-nm Node

Inverse e-beam lithography on photomask for computational lithography

[+] Author Affiliations
Jin Choi

Samsung Electronics Co., Ltd., San #16 Banwol-Dong, Hwasung City, Gyeonggi-Do 446-711 Republic of Korea

Ji Soong Park, In Kyun Shin, Chan-Uk Jeon

Samsung Electronics Co., Ltd., San #16 Banwol-Dong, Hwasung City, Gyeonggi-Do 446-711 Republic of Korea

J. Micro/Nanolith. MEMS MOEMS. 13(1), 011003 (Dec 02, 2013). doi:10.1117/1.JMM.13.1.011003
History: Received June 24, 2013; Revised September 1, 2013; Accepted October 1, 2013
Text Size: A A A

Abstract.  Computational lithography, e.g., inverse lithography technique (ILT) and source mask optimization, is considered necessary for the “extremely low k1” lithography process of sub-20 nm device node. The ideal design of a curvilinear mask for computational lithography requires many changes during photomask fabrication. These range from preparation of the mask data to measurement and inspection. The manufacturability of a photomask for computational lithography is linked to predictable and manageable quality of patterning. Here, we have proposed the use of “inverse e-beam lithography” on photomask for computational lithography, which overcomes the patterning accuracy limits of conventional e-beam lithography. Furthermore, the preferred target design for ILT, a new verification method, and the accuracy required for the mask model are also discussed; with consideration of acceptable writing time (<24h) and computing power.

© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Jin Choi ; Ji Soong Park ; In Kyun Shin and Chan-Uk Jeon
"Inverse e-beam lithography on photomask for computational lithography", J. Micro/Nanolith. MEMS MOEMS. 13(1), 011003 (Dec 02, 2013). ; http://dx.doi.org/10.1117/1.JMM.13.1.011003


Tables

Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.