Special Section on Optical Lithography Extension Beyond the 14-nm Node

Holistic optimization architecture enabling sub-14-nm projection lithography

[+] Author Affiliations
Jan Mulkens

ASML Netherlands B.V., De Run 6501, 5504 DR Veldhoven, The Netherlands

Paul Hinnen

ASML Netherlands B.V., De Run 6501, 5504 DR Veldhoven, The Netherlands

Michael Kubis

ASML Netherlands B.V., De Run 6501, 5504 DR Veldhoven, The Netherlands

Alexander Padiy

ASML Netherlands B.V., De Run 6501, 5504 DR Veldhoven, The Netherlands

Jos Benschop

ASML Netherlands B.V., De Run 6501, 5504 DR Veldhoven, The Netherlands

J. Micro/Nanolith. MEMS MOEMS. 13(1), 011006 (Jan 07, 2014). doi:10.1117/1.JMM.13.1.011006
History: Received July 1, 2013; Revised December 3, 2013; Accepted December 11, 2013
Text Size: A A A

Abstract.  Parallel with the introduction of EUV lithography, immersion lithography is being extended to the 14- and 10-nm node, and the lithography performance requirements need to be tightened further to enable this shrink. Next to generic scanner system improvements, application-specific solutions are needed to follow the requirements for critical dimension (CD) control and overlay. The application-specific solutions need a holistic optimization approach for the scanner, the mask, and the patterning process. We will describe the holistic lithography systems architecture that enables dynamic use of high-order scanner optimization based on advanced actuators of projection lens and scanning stages. Next to the scanner system, key components of this architecture are an angle-resolved scatterometer to measure CD, overlay, and focus, and an off-tool computation server to calculate application-specific recipes for the scanner. Based on real production wafer data, we will show the benefit for CD control, focus control, and overlay control, and demonstrate lithography performance levels required for 14- and 10-nm node production.

© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Jan Mulkens ; Paul Hinnen ; Michael Kubis ; Alexander Padiy and Jos Benschop
"Holistic optimization architecture enabling sub-14-nm projection lithography", J. Micro/Nanolith. MEMS MOEMS. 13(1), 011006 (Jan 07, 2014). ; http://dx.doi.org/10.1117/1.JMM.13.1.011006


Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.