Special Section on Optical Lithography Extension Beyond the 14-nm Node

Hotspot prevention and detection method using an image-recognition technique based on higher-order local autocorrelation

[+] Author Affiliations
Hirokazu Nosato

Information Technology Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), AIST Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan

Hidenori Sakanashi

Information Technology Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), AIST Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan

Eiichi Takahashi

Information Technology Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), AIST Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan

Masahiro Murakawa

Information Technology Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), AIST Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan

Tetsuaki Matsunawa

Toshiba Corporation Semiconductor & Storage Products Company 1, Lithography Process Development Group 1, Lithography Process Technology Department, Center for Semiconductor Research & Development, Komukai Toshiba-Cho, Saiwai-Ku, Kawasaki 212-8583, Japan

Shimon Maeda

Toshiba Corporation Semiconductor & Storage Products Company 1, Lithography Process Development Group 1, Lithography Process Technology Department, Center for Semiconductor Research & Development, Komukai Toshiba-Cho, Saiwai-Ku, Kawasaki 212-8583, Japan

Satoshi Tanaka

Toshiba Corporation Semiconductor & Storage Products Company 1, Lithography Process Development Group 1, Lithography Process Technology Department, Center for Semiconductor Research & Development, Komukai Toshiba-Cho, Saiwai-Ku, Kawasaki 212-8583, Japan

Shoji Mimotogi

Toshiba Corporation Semiconductor & Storage Products Company 1, Lithography Process Development Group 1, Lithography Process Technology Department, Center for Semiconductor Research & Development, Komukai Toshiba-Cho, Saiwai-Ku, Kawasaki 212-8583, Japan

J. Micro/Nanolith. MEMS MOEMS. 13(1), 011007 (Feb 06, 2014). doi:10.1117/1.JMM.13.1.011007
History: Received April 30, 2013; Revised December 26, 2013; Accepted January 14, 2014
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Abstract.  Although a number of factors relating to lithography and material stacking have been investigated to realize hotspot-free wafer images, hotspots are often still found on wafers. For the 22-nm technology node and beyond, the detection and repair of hotspots with lithography simulation models is extremely time-consuming. Thus, hotspots represent a critical problem that not only causes delays to process development but also represents lost business opportunities. In order to solve the time-consumption problem of hotspots, this paper proposes a new method of hotspot prevention and detection using an image recognition technique based on higher-order local autocorrelation, which is adopted to extract geometrical features from a layout pattern. To prevent hotspots, our method can generate proper verification patterns to cover the pattern variations within a chip layout to optimize the lithography conditions. Moreover, our method can realize fast hotspot detection without lithography simulation models. Obtained experimental results for hotspot prevention indicated excellent performance in terms of the similarity between generated proposed patterns and the original chip layout patterns, both geometrically and optically. Moreover, the proposed hotspot detection method could achieve turn-around time reductions of >95% for just one CPU, compared to the conventional simulation-based approach, without accuracy losses.

© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Hirokazu Nosato ; Hidenori Sakanashi ; Eiichi Takahashi ; Masahiro Murakawa ; Tetsuaki Matsunawa, et al.
"Hotspot prevention and detection method using an image-recognition technique based on higher-order local autocorrelation", J. Micro/Nanolith. MEMS MOEMS. 13(1), 011007 (Feb 06, 2014). ; http://dx.doi.org/10.1117/1.JMM.13.1.011007


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