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Diffusion-induced structural changes in La/B-based multilayers for 6.7-nm radiation

[+] Author Affiliations
Steven L. Nyabero

FOM Dutch Institute for Fundamental Energy Research, P.O. Box 1207, 3430 BE Nieuwegein, The Netherlands

Robbert W. E. van de Kruijs

FOM Dutch Institute for Fundamental Energy Research, P.O. Box 1207, 3430 BE Nieuwegein, The Netherlands

Andrey E. Yakshin

FOM Dutch Institute for Fundamental Energy Research, P.O. Box 1207, 3430 BE Nieuwegein, The Netherlands

Igor A. Makhotkin

FOM Dutch Institute for Fundamental Energy Research, P.O. Box 1207, 3430 BE Nieuwegein, The Netherlands

Jeroen Bosgra

FOM Dutch Institute for Fundamental Energy Research, P.O. Box 1207, 3430 BE Nieuwegein, The Netherlands

Fred Bijkerk

FOM Dutch Institute for Fundamental Energy Research, P.O. Box 1207, 3430 BE Nieuwegein, The Netherlands

University of Twente, MESA+ Institute for Nanotechnology, P.O. Box 217, 7500 AE Enschede, The Netherlands

J. Micro/Nanolith. MEMS MOEMS. 13(1), 013014 (Mar 17, 2014). doi:10.1117/1.JMM.13.1.013014
History: Received November 12, 2013; Revised February 3, 2014; Accepted February 13, 2014
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Abstract.  The thermal stability of La/B and LaN/B multilayers was investigated. The two multilayer systems were found to have comparable subångström period expansion upon annealing in the temperature range of 250°C to 400°C. For La/B multilayers, wide angle x-ray diffraction analysis revealed that the size of LaB6 crystallites present did not change significantly upon thermal treatment. Using grazing incidence x-ray reflectometry, strong change in the internal structure due to interdiffusion at the interfaces of La/B multilayers was observed after annealing. This, coupled to the unchanged crystallinity, suggested the growth of amorphous lanthanum boride interlayers. At wavelength reflectance, measurements showed that as-deposited LaN/B multilayers had an enhanced optical contrast compared with La/B. During thermal loading, the rate of diffusion-induced reflectance decrease in LaN/B multilayers was slower than in La/B. The enhanced thermal stability of LaN/B was attributed to the slower growth of LaN-B interfaces compared with La-B.

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© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Steven L. Nyabero ; Robbert W. E. van de Kruijs ; Andrey E. Yakshin ; Igor A. Makhotkin ; Jeroen Bosgra, et al.
"Diffusion-induced structural changes in La/B-based multilayers for 6.7-nm radiation", J. Micro/Nanolith. MEMS MOEMS. 13(1), 013014 (Mar 17, 2014). ; http://dx.doi.org/10.1117/1.JMM.13.1.013014


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