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Fabrication of three-dimensional and submicrometer-scaled microstructures based on metal contact printing and silicon bulk machining

[+] Author Affiliations
Kuo-Lun Kao

National Cheng Kung University, Department of Mechanical Engineering, Tainan 70101, Taiwan

Cho-Wei Chang

National Cheng Kung University, Department of Mechanical Engineering, Tainan 70101, Taiwan

National Cheng Kung University, Institute of Nanotechnology and Microsystems Engineer, Tainan 70101, Taiwan

Yung-Chun Lee

National Cheng Kung University, Department of Mechanical Engineering, Tainan 70101, Taiwan

National Cheng Kung University, Institute of Nanotechnology and Microsystems Engineer, Tainan 70101, Taiwan

J. Micro/Nanolith. MEMS MOEMS. 13(2), 023008 (May 21, 2014). doi:10.1117/1.JMM.13.2.023008
History: Received March 21, 2014; Revised April 21, 2014; Accepted May 5, 2014
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Abstract.  This paper describes a method that contains a series of processes for producing three-dimensional (3-D) microstructures with a feature size in the submicrometer scale. It starts from using a metal contact printing lithography to pattern a thin metal film on the surface of a (100) silicon substrate. The metal film has a hole-array pattern with a hole diameter ranging from 300 nm to 800 nm and is used as an etching mask for silicon bulk machining to create concave pyramid-shaped surface microstructures. Using this bulk-machined silicon substrate as a template, polymer 3-D microstructures are replicated on top of a silicon dioxide (SiO2) layer. Finally, through a dry etching process, 3-D microstructures with a profile similar to the replicated polymer microstructures are formed on the SiO2 layer. Potential applications of these fabricated SiO2 microstructures in the light-emitting diode industry will be addressed.

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© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Kuo-Lun Kao ; Cho-Wei Chang and Yung-Chun Lee
"Fabrication of three-dimensional and submicrometer-scaled microstructures based on metal contact printing and silicon bulk machining", J. Micro/Nanolith. MEMS MOEMS. 13(2), 023008 (May 21, 2014). ; http://dx.doi.org/10.1117/1.JMM.13.2.023008


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