Regular Articles

Mask defect management in extreme-ultraviolet lithography

[+] Author Affiliations
Nai-Ching Chen

Taiwan Semiconductor Manufacturing Company Ltd., 168, Park Avenue 2, Hsinchu 308-44, Taiwan

Chia-Hao Yu

Taiwan Semiconductor Manufacturing Company Ltd., 168, Park Avenue 2, Hsinchu 308-44, Taiwan

Ching-Fang Yu

Taiwan Semiconductor Manufacturing Company Ltd., 168, Park Avenue 2, Hsinchu 308-44, Taiwan

Chi-Lun Lu

Taiwan Semiconductor Manufacturing Company Ltd., 168, Park Avenue 2, Hsinchu 308-44, Taiwan

James Chu

Taiwan Semiconductor Manufacturing Company Ltd., 168, Park Avenue 2, Hsinchu 308-44, Taiwan

Luke Hsu

Taiwan Semiconductor Manufacturing Company Ltd., 168, Park Avenue 2, Hsinchu 308-44, Taiwan

Angus Chin

Taiwan Semiconductor Manufacturing Company Ltd., 168, Park Avenue 2, Hsinchu 308-44, Taiwan

Anthony Yen

Taiwan Semiconductor Manufacturing Company Ltd., 168, Park Avenue 2, Hsinchu 308-44, Taiwan

J. Micro/Nanolith. MEMS MOEMS. 13(2), 023010 (Jun 16, 2014). doi:10.1117/1.JMM.13.2.023010
History: Received November 19, 2013; Revised April 30, 2014; Accepted April 30, 2014
Text Size: A A A

Abstract.  We present a series of baseline techniques for inspection, cleaning, repair, and native defect mitigation of extreme ultraviolet (EUV) masks. Deep-ultraviolet inspectors are capable of inspecting patterns down to about 45 nm in pitch on wafer. Cleaning methods involving both chemical and physical forces have achieved good particle removal efficiency while minimizing absorber shrinkage and have realized 90% PRE in removing particles from the backside of an EUV mask. In addition, our compensation method for native defect repair has achieved partial success.

© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Nai-Ching Chen ; Chia-Hao Yu ; Ching-Fang Yu ; Chi-Lun Lu ; James Chu, et al.
"Mask defect management in extreme-ultraviolet lithography", J. Micro/Nanolith. MEMS MOEMS. 13(2), 023010 (Jun 16, 2014). ; http://dx.doi.org/10.1117/1.JMM.13.2.023010


Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Journal Articles

Related Book Chapters

Topic Collections

PubMed Articles
Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.