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Size and shape control of sub-20 nm patterns fabricated using focused electron beam-induced processing

[+] Author Affiliations
Sangeetha Hari

Delft University of Technology, Department of Imaging Physics, Charged Particle Optics Group, Lorentzweg 1, 2628 CJ Delft, The Netherlands

Cornelis W. Hagen

Delft University of Technology, Department of Imaging Physics, Charged Particle Optics Group, Lorentzweg 1, 2628 CJ Delft, The Netherlands

Thomas Verduin

Delft University of Technology, Department of Imaging Physics, Charged Particle Optics Group, Lorentzweg 1, 2628 CJ Delft, The Netherlands

Pieter Kruit

Delft University of Technology, Department of Imaging Physics, Charged Particle Optics Group, Lorentzweg 1, 2628 CJ Delft, The Netherlands

J. Micro/Nanolith. MEMS MOEMS. 13(3), 033002 (Jul 03, 2014). doi:10.1117/1.JMM.13.3.033002
History: Received February 28, 2014; Revised May 26, 2014; Accepted June 5, 2014
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Abstract.  In a first study to analyze the feasibility of electron beam-induced deposition (EBID) for creating certain patterns in advanced lithography, line patterns were fabricated on silicon wafers using EBID. The growth conditions were such that the growth rate is fully determined by the electron flux (the current limited growth regime). It is experimentally verified that different patterning strategies, such as serial versus parallel patterning and single pass patterning versus multiple pass patterning, all lead to the same result in this growth regime. Images of EBID lines, imaged in a scanning electron microscope, were analyzed to determine the position of the lines, the width of the lines, and the linewidth roughness (LWR). The results are that the lines have an average width of 13.7 nm, an average standard deviation of 1.6 nm in the center position of the lines, and an average LWR of 4.5 nm (1σ value). As an example of the capabilities of EBID, a logic-resembling lithography pattern was fabricated.

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© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Sangeetha Hari ; Cornelis W. Hagen ; Thomas Verduin and Pieter Kruit
"Size and shape control of sub-20 nm patterns fabricated using focused electron beam-induced processing", J. Micro/Nanolith. MEMS MOEMS. 13(3), 033002 (Jul 03, 2014). ; http://dx.doi.org/10.1117/1.JMM.13.3.033002


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