Special Section on Alternative Lithographic Technologies III

Nanoimprint lithography process chains for the fabrication of micro- and nanodevices

[+] Author Affiliations
Helmut Schift

Paul Scherrer Institute, Laboratory for Micro and Nanotechnology, 5232 Villigen PSI, Switzerland

Prabitha Urwyler

Paul Scherrer Institute, Laboratory for Micro and Nanotechnology, 5232 Villigen PSI, Switzerland

University of Bern, Gerontechnology and Rehabilitation Group, 3010 Bern, Switzerland

Per Magnus Kristiansen

University of Applied Sciences and Arts, Institute of Polymer Engineering, 5210 Windisch, Switzerland

Jens Gobrecht

Paul Scherrer Institute, Laboratory for Micro and Nanotechnology, 5232 Villigen PSI, Switzerland

University of Applied Sciences and Arts, Institute of Polymer Engineering, 5210 Windisch, Switzerland

J. Micro/Nanolith. MEMS MOEMS. 13(3), 031303 (Jul 18, 2014). doi:10.1117/1.JMM.13.3.031303
History: Received April 16, 2014; Revised May 30, 2014; Accepted June 3, 2014
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Abstract.  The nanoimprint lithography (NIL) process with its key elements molding and thin film pattern transfer refers to the established process chain of resist-based patterning of hard substrates. Typical processes for mass fabrication are either wafer-scale imprint or continuous roll-to-roll processes. In contrast to this, similar process chains were established for polymeric microelements fabricated by injection molding, particularly when surface topographies need to be integrated into monolithic polymer elements. NIL needs to be embedded into the framework of general replication technologies, with sizes ranging from nanoscopic details to macroscopic entities. This contribution presents elements of a generalized replication process chain involving NIL and demonstrates its wide application by presenting nontypical NIL products, such as an injection-molded microcantilever. Additionally, a hybrid approach combining NIL and injection molding in a single tool is presented. Its aim is to introduce a toolbox approach for nanoreplication into NIL-based processing and to facilitate the choice of suitable processes for micro- and nanodevices. By proposing a standardized process flow as described in the NaPANIL library of processes, the use of establish process sequences for new applications is facilitated.

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© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Helmut Schift ; Prabitha Urwyler ; Per Magnus Kristiansen and Jens Gobrecht
"Nanoimprint lithography process chains for the fabrication of micro- and nanodevices", J. Micro/Nanolith. MEMS MOEMS. 13(3), 031303 (Jul 18, 2014). ; http://dx.doi.org/10.1117/1.JMM.13.3.031303


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