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Fundamental study of placement errors in directed self-assembly

[+] Author Affiliations
Sander F. Wuister

ASML De Run 6501, Veldhoven 5504DR, The Netherlands

Davide Ambesi, Jo Finders

ASML De Run 6501, Veldhoven 5504DR, The Netherlands

Tamara S. Druzhinina

ASML De Run 6501, Veldhoven 5504DR, The Netherlands

Emiel Peeters

Philips Group Innovation, Research, Department of Applied Chemical Technology, High Tech Campus 7, 5656AE Eindhoven, The Netherlands

Joanne Klein Wolterink

Culgi B.V. P.O. Box 252, AG Leiden 2300, The Netherlands

Johannes G. E. M. (Hans) Fraaije

Culgi B.V. P.O. Box 252, AG Leiden 2300, The Netherlands

Leiden University, Leiden Institute of Chemistry, Soft Matter Chemistry Group, P.O. Box 9502, RA Leiden 2300, The Netherlands

J. Micro/Nanolith. MEMS MOEMS. 13(3), 033005 (Jul 25, 2014). doi:10.1117/1.JMM.13.3.033005
History: Received March 20, 2014; Revised June 11, 2014; Accepted June 27, 2014
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Abstract.  Contact holes (CHs) created by 193i lithography were shrunken by directed self-assembly of polystyrene-b-methylmethacrylate (PS-PMMA) block copolymers (BCPs). The placement error of these highly confined systems is determined both experimentally and by simulations. Good agreement between simulations (2 nm) and experiments was observed (2 nm). Extensive simulations show that the placement error is dependent on the length of the PS block only, indicating that the placement error is intrinsic to the BCP. This was explained by considering the BCPs as springs. For double CHs, a relation is found between the offset of the CH from the center of the CHs and the additional placement error.

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© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Sander F. Wuister ; Davide Ambesi ; Tamara S. Druzhinina ; Emiel Peeters ; Jo Finders, et al.
"Fundamental study of placement errors in directed self-assembly", J. Micro/Nanolith. MEMS MOEMS. 13(3), 033005 (Jul 25, 2014). ; http://dx.doi.org/10.1117/1.JMM.13.3.033005


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