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Multilayer lift-off process for sub-15-nm patterning by step-and-repeat ultraviolet nanoimprint lithography

[+] Author Affiliations
Giuseppe Calafiore, Christophe Peroz

aBeam Technologies Inc., 22290 Foothill Boulevard, Suite 2, Hayward, California 94541, United States

Scott Dhuey, Simone Sassolini, David Gosselin, Deirdre Olynick, Stefano Cabrini

Molecular Foundry, Lawrence Berkeley National Laboratory, 67 Cyclotron Road, Berkeley, California 94720, United States

Nerea Alayo

Instituto de Microelectronica de Barcelona Campus UAB, Bellaterra, Barcelona 08193, Spain

Marko Vogler

Micro Resist Technology, Kopenicker Street 325, Berlin D-12555, Germany

J. Micro/Nanolith. MEMS MOEMS. 13(3), 033013 (Sep 05, 2014). doi:10.1117/1.JMM.13.3.033013
History: Received May 23, 2014; Revised August 13, 2014; Accepted August 15, 2014
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Abstract.  Numerous studies report the importance of nanoscale metallic features to increase the sensitivity of gas sensors, biodetectors, and for the fabrication of the new-generation plasmonic devices. So far, nanoimprint lithography has not shown the capability to pattern a metallic structure that would both be sub-15 nm and sufficiently thick to ensure electrical conductance. To overcome these limitations, we report a step and repeat nanoimprint lithography (SR-NIL) on a pre-spin-coated layer stack. This work reports the fabrication of sub-15-nm lines that are 15-nm thick and have a 50-nm-half-pitch grating with 35-nm-thick metal, which represents the new state of the art for SR-NIL.

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© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Giuseppe Calafiore ; Scott Dhuey ; Simone Sassolini ; Nerea Alayo ; David Gosselin, et al.
"Multilayer lift-off process for sub-15-nm patterning by step-and-repeat ultraviolet nanoimprint lithography", J. Micro/Nanolith. MEMS MOEMS. 13(3), 033013 (Sep 05, 2014). ; http://dx.doi.org/10.1117/1.JMM.13.3.033013


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