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Pitch variations of self-assembled cylindrical block copolymers in lithographically defined trenches

[+] Author Affiliations
Henk Boots

Philips Group Innovation, Research, High Tech Campus 7, 5656AE Eindhoven, The Netherlands

Jessica M. de Ruiter, Thanh Trung Nguyen, Aurelie Brizard

Philips Group Innovation, Research, High Tech Campus 7, 5656AE Eindhoven, The Netherlands

Emiel Peeters

Philips Group Innovation, Research, High Tech Campus 7, 5656AE Eindhoven, The Netherlands

Sander F. Wuister

R&D Department, ASML, De Run 6501, 5504 DR Veldhoven, The Netherlands

Tamara S. Druzhinina

R&D Department, ASML, De Run 6501, 5504 DR Veldhoven, The Netherlands

Joanne Klein Wolterink

Culgi B.V., P.O. Box 252, 2300 AG Leiden, The Netherlands

Johannes G. E. M. (Hans) Fraaije

Culgi B.V., P.O. Box 252, 2300 AG Leiden, The Netherlands

Leiden University, Soft Matter Chemistry Group, Leiden Institute of Chemistry, P.O. Box 9502, 2300 RA Leiden, The Netherlands

J. Micro/Nanolith. MEMS MOEMS. 13(3), 033015 (Sep 15, 2014). doi:10.1117/1.JMM.13.3.033015
History: Received April 29, 2014; Revised August 1, 2014; Accepted August 11, 2014
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Abstract.  A detailed analysis of the impact of pitch variations in block copolymer self-assembly patterns on defect density and placement errors inside lithographically defined trenches is presented. The presence of random variations in the pitch of nanopatterns resulting from the self-assembly of cylindrical phase block copolymer in open trenches (one-dimensional confinement) is experimentally demonstrated and confirmed by theoretical modeling. The simulations show that the intrinsic pitch spread is not affected when the same block copolymer is studied inside closed trenches (two-dimensional confinement) where the observed spread has a direct influence on placement and defectivity. The magnitude of the detrimental impact of the pitch variations on both defect density and placement accuracy in closed trenches is strongly dependent on trench length. These findings pose new design rules for future applications of directed self-assembly in semiconductor industry.

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© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Henk Boots ; Jessica M. de Ruiter ; Thanh Trung Nguyen ; Aurelie Brizard ; Emiel Peeters, et al.
"Pitch variations of self-assembled cylindrical block copolymers in lithographically defined trenches", J. Micro/Nanolith. MEMS MOEMS. 13(3), 033015 (Sep 15, 2014). ; http://dx.doi.org/10.1117/1.JMM.13.3.033015


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