Lithography parametric yield estimation model to predict layout pattern distortions with a reduced set of lithography simulations

Sergio Gómez; Francesc Moll; Joan Mauricio

doi:10.1117/1.JMM.13.3.033016

16 September 2014 Lithography parametric yield estimation model to predict layout pattern distortions with a reduced set of lithography simulations

Sergio Gómez, Francesc Moll, Joan Mauricio

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 13, Issue 3, 033016 (September 2014). https://doi.org/10.1117/1.JMM.13.3.033016

Abstract

A lithography parametric yield estimation model is presented to evaluate the lithography distortion in a printed layout due to lithography hotspots. The aim of the proposed yield model is to provide a new metric that enables the possibility to objectively compare the lithography quality of different layout design implementations. Moreover, we propose a pattern construct classifier to reduce the set of lithography simulations necessary to estimate the litho degradation. The application of the yield model is demonstrated for different layout configurations showing that a certain degree of layout regularity improves the parametric yield and increases the number of good dies per wafer.

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Sergio Gómez, Francesc Moll, and Joan Mauricio "Lithography parametric yield estimation model to predict layout pattern distortions with a reduced set of lithography simulations," Journal of Micro/Nanolithography, MEMS, and MOEMS 13(3), 033016 (16 September 2014). https://doi.org/10.1117/1.JMM.13.3.033016

Published: 16 September 2014

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