Special Section on Holistic/Hybrid Metrology

Real-time inspection system utilizing scatterometry pupil data

[+] Author Affiliations
Jae Yeon Baek

University of California, Berkeley, Electrical Engineering and Computer Sciences, 406 Cory Hall, Berkeley, California 94720, United States

Philippe Leray

Interuniversitair Micro-Elektronica Centrum, Kapeldreef 75, B-3001 Leuven, Belgium

Anne-Laure Charley

Interuniversitair Micro-Elektronica Centrum, Kapeldreef 75, B-3001 Leuven, Belgium

Costas J. Spanos

University of California, Berkeley, Electrical Engineering and Computer Sciences, 406 Cory Hall, Berkeley, California 94720, United States

J. Micro/Nanolith. MEMS MOEMS. 13(4), 041403 (Sep 19, 2014). doi:10.1117/1.JMM.13.4.041403
History: Received May 5, 2014; Revised August 26, 2014; Accepted August 28, 2014
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Abstract.  Scatterometry-based critical dimension (CD), also known as optical CD (OCD), significantly matches CD scanning electron microscopy in accuracy and precision, in addition to offering superior full-profile reconstruction. OCD, however, is computationally intensive. We construct an extremely fast screening tool that determines whether a sample should or should not proceed to subsequent manufacturing steps. To this end, we examine the diffraction signals of the grating in order to determine whether a sample is in or out of its specification limits. This allows us to allocate traditional metrology resources only for samples that show unusual behavior. Support vector machines (SVMs) are trained to classify each incoming sample as in-spec or out-of-spec. The constructed classifier is applied to gratings exposed with a focus-exposure matrix for a rectangular silicon-bottom anti-reflective coating-photoresist stack, which include erroneous samples with under–over exposure, necking, and bridging problems. The misclassification rates as well as false and missed alarm rates are analyzed. Results show that our prototype screening system has misclassification errors on the order of 5% to 10%, while the computation time is on the order of one vector dot product.

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© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Jae Yeon Baek ; Philippe Leray ; Anne-Laure Charley and Costas J. Spanos
"Real-time inspection system utilizing scatterometry pupil data", J. Micro/Nanolith. MEMS MOEMS. 13(4), 041403 (Sep 19, 2014). ; http://dx.doi.org/10.1117/1.JMM.13.4.041403


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