Special Section on Holistic/Hybrid Metrology

Exact and reliable overlay metrology in nanoscale semiconductor devices using an image processing method

[+] Author Affiliations
Jinkook Park

Samsung Electronics, Memory Division, San #16 Banwol-Dong, Hwasung-City, Gyeonggi-do 445-701, Republic of Korea

ChaeHo Shin

Samsung Electronics, Memory Division, San #16 Banwol-Dong, Hwasung-City, Gyeonggi-do 445-701, Republic of Korea

Minkook Kim

Samsung Electronics, Memory Division, San #16 Banwol-Dong, Hwasung-City, Gyeonggi-do 445-701, Republic of Korea

Junghwan Kim

Samsung Electronics, Memory Division, San #16 Banwol-Dong, Hwasung-City, Gyeonggi-do 445-701, Republic of Korea

JeongKyun Park

Samsung Electronics, Memory Division, San #16 Banwol-Dong, Hwasung-City, Gyeonggi-do 445-701, Republic of Korea

JungSoo Kim

Samsung Electronics, Memory Division, San #16 Banwol-Dong, Hwasung-City, Gyeonggi-do 445-701, Republic of Korea

ChungSam Jun

Samsung Electronics, Memory Division, San #16 Banwol-Dong, Hwasung-City, Gyeonggi-do 445-701, Republic of Korea

Yeny Yim

Samsung Electronics, Manufacturing Technology Center, Samsung-Ro #129, Yeongtong-gu, Suwon-City, Gyeonggi-do 443-742, Republic of Korea

Janghee Lee

Samsung Electronics, Manufacturing Technology Center, Samsung-Ro #129, Yeongtong-gu, Suwon-City, Gyeonggi-do 443-742, Republic of Korea

J. Micro/Nanolith. MEMS MOEMS. 13(4), 041409 (Oct 10, 2014). doi:10.1117/1.JMM.13.4.041409
History: Received June 6, 2014; Revised September 2, 2014; Accepted September 19, 2014
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Abstract.  As semiconductor processing becomes more complicated and pattern sizes shrink, the overlay metrology has become one of the most important issues in the semiconductor industry. Therefore, in order to obtain correct, reliable overlay values in semiconductor fabrication facilities (fab), quantization methods for the efficient management and implementation of a measurement algorithm are required, as well as an understanding of the target structures in the semiconductor device. We implemented correct, reliable overlay values in the pattern using the image processing method. The quantization method, through correlation analysis and a new algorithm for target structures, were able to improve the sensitivity to misalignment in the pattern and enable more stable and credible in-line measurement by decreasing the distribution of the residuals in overlay values. Since overlay values of the pattern in the fab were measured and managed more reliably and quickly, it is expected that our study will be able to contribute to the yield enhancement of semiconductor companies.

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© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Jinkook Park ; ChaeHo Shin ; Minkook Kim ; Junghwan Kim ; JeongKyun Park, et al.
"Exact and reliable overlay metrology in nanoscale semiconductor devices using an image processing method", J. Micro/Nanolith. MEMS MOEMS. 13(4), 041409 (Oct 10, 2014). ; http://dx.doi.org/10.1117/1.JMM.13.4.041409


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