Special Section on Holistic/Hybrid Metrology

Scatterometry performance enhancement by holistic approach

[+] Author Affiliations
Jie Li

Nanometrics Inc., 1550 Buckeye Drive, Milpitas, California 95035, United States

Shahin Zangooie

HGST, A Western Digital Company, 5601 Great Oaks Parkway, San Jose, California 95119, United States

Karthik Boinapally

Nanometrics Inc., 1550 Buckeye Drive, Milpitas, California 95035, United States

Xi Zou

Nanometrics Inc., 1550 Buckeye Drive, Milpitas, California 95035, United States

Jiangtao Hu

Nanometrics Inc., 1550 Buckeye Drive, Milpitas, California 95035, United States

Zhuan Liu

Nanometrics Inc., 1550 Buckeye Drive, Milpitas, California 95035, United States

Sanjay Yedur

Nanometrics Inc., 1550 Buckeye Drive, Milpitas, California 95035, United States

Peter Wilkens

HGST, A Western Digital Company, 5601 Great Oaks Parkway, San Jose, California 95119, United States

Avraham Ver

HGST, A Western Digital Company, 5601 Great Oaks Parkway, San Jose, California 95119, United States

Robert Cohen

HGST, A Western Digital Company, 5601 Great Oaks Parkway, San Jose, California 95119, United States

Babak Khamsehpour

HGST, A Western Digital Company, 5601 Great Oaks Parkway, San Jose, California 95119, United States

Holger Schroder

HGST, A Western Digital Company, 5601 Great Oaks Parkway, San Jose, California 95119, United States

John Piggot

HGST, A Western Digital Company, 5601 Great Oaks Parkway, San Jose, California 95119, United States

J. Micro/Nanolith. MEMS MOEMS. 13(4), 041406 (Oct 16, 2014). doi:10.1117/1.JMM.13.4.041406
History: Received May 14, 2014; Revised August 20, 2014; Accepted September 19, 2014
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Abstract.  Scatterometry performance enhancement is demonstrated through a holistic approach by utilizing comprehensive information from various sources, including data from different process steps, different toolsets, multiple structures, and multiple optical channels using samples from magnetic hard disk drive manufacturing. Parameter and spectrum feed-forward are performed across multiple targets at the photo step and the photo results are fed forward to the post-reactive ion etch (RIE) step. For an isolated structure with critical dimensions (CD) much smaller than the incident light wavelengths, feed-forward methods improve CD correlation with a general improvement of 20 to 60% in precision and fleet measurement precision (FMP). A second technique examined is hybrid metrology, where inputs from source tools, such as CD-SEM and CD-AFM, are used to determine critical parameters. Hybridization of line edge roughness results in CD and sidewall angle (SWA) FMP improvement of 60%. We also demonstrate improved CD accuracy using azimuthal scatterometry at 0, 45, and 90 deg azimuth angles measuring resist lines with CD larger than the incident light wavelengths. FMP reductions of 60 and 30% are obtained for CD and SWA. SWA hybridization after RIE results in CD and SWA FMP improvements by >50 and 30%, respectively.

Figures in this Article
© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Jie Li ; Shahin Zangooie ; Karthik Boinapally ; Xi Zou ; Jiangtao Hu, et al.
"Scatterometry performance enhancement by holistic approach", J. Micro/Nanolith. MEMS MOEMS. 13(4), 041406 (Oct 16, 2014). ; http://dx.doi.org/10.1117/1.JMM.13.4.041406


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