Special Section on Continuation of Scaling with Optical and Complementary Lithography

In situ aberration measurement method using a phase-shift ring mask

[+] Author Affiliations
Sikun Li

Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Laboratory of Information Optics and Opto-Electronic Technology, Shanghai 201800, China

Xiangzhao Wang

Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Laboratory of Information Optics and Opto-Electronic Technology, Shanghai 201800, China

University of the Chinese Academy of Sciences, Beijing 100039, China

Jishuo Yang

Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Laboratory of Information Optics and Opto-Electronic Technology, Shanghai 201800, China

University of the Chinese Academy of Sciences, Beijing 100039, China

Lifeng Duan

Shanghai Micro Electronics Equipment Co., Ltd., System Engineering Department, Shanghai 201203, China

Feng Tang

Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Laboratory of Information Optics and Opto-Electronic Technology, Shanghai 201800, China

University of the Chinese Academy of Sciences, Beijing 100039, China

Guanyong Yan

Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Laboratory of Information Optics and Opto-Electronic Technology, Shanghai 201800, China

University of the Chinese Academy of Sciences, Beijing 100039, China

J. Micro/Nanolith. MEMS MOEMS. 14(1), 011005 (Nov 13, 2014). doi:10.1117/1.JMM.14.1.011005
History: Received June 8, 2014; Accepted October 17, 2014
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Abstract.  An in situ aberration measurement method using a phase-shift ring mask is proposed for a lithographic projection lens whose numerical aperture is below 0.8. In this method, two-dimensional phase-shift rings are designed as the measurement mask. A linear relationship model between the intensity distribution of the lateral aerial image and the aberrations is built by principal component analysis and multivariate linear regression analyses. Compared with the principal component analysis of the aerial images (AMAI-PCA) method, in which a binary mask and through-focus aerial images are used for aberration extraction, the aerial images of the phase-shift ring mask contain more useful information, providing the possibility to eliminate the crosstalk between different kinds of aberrations. Therefore, the accuracy of the aberration measurement is improved. Simulations with the lithography simulator Dr.LiTHO showed that the accuracy is improved by 15% and five more Zernike aberrations can be measured compared with the standard AMAI-PCA. Moreover, the proposed method requires less measured aerial images and is faster than the AMAI-PCA.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Sikun Li ; Xiangzhao Wang ; Jishuo Yang ; Lifeng Duan ; Feng Tang, et al.
"In situ aberration measurement method using a phase-shift ring mask", J. Micro/Nanolith. MEMS MOEMS. 14(1), 011005 (Nov 13, 2014). ; http://dx.doi.org/10.1117/1.JMM.14.1.011005


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