The performance of overlay metrology as total measurement uncertainty, design rule compatibility, device correlation, and measurement accuracy has been challenged at the nm node and below. The process impact on overlay metrology is becoming critical, and techniques to improve measurement accuracy become increasingly important. We present a methodology for improving the overlay accuracy. A propriety quality metric, Qmerit, is used to identify overlay metrology measurement settings with the least process impacts and reliable accuracies. Using the quality metric, a calibration method, Archer self-calibration, is then used to remove the inaccuracies. Accuracy validation can be achieved by correlation to reference overlay data from another independent metrology source such as critical dimension–scanning electron microscopy data collected on a device correlated metrology hybrid target or by electrical testing. Additionally, reference metrology can also be used to verify which measurement conditions are the most accurate. We provide an example of such a case.