Special Section on Holistic/Hybrid Metrology

Hybrid metrology co-optimization of critical dimension scanning electron microscope and optical critical dimension

[+] Author Affiliations
Alok Vaid

GlobalFoundries, 400 Stonebreak Road Extension, Malta, New York 12020, United States

Carmen Osorio

GlobalFoundries, 400 Stonebreak Road Extension, Malta, New York 12020, United States

Jamie Tsai

GlobalFoundries, 400 Stonebreak Road Extension, Malta, New York 12020, United States

Cornel Bozdog

Nova Measuring Instruments, Inc., 2055 Gateway Place, Suite 470, San Jose, California 95110, United States

Matthew Sendelbach

Nova Measuring Instruments, Inc., 2055 Gateway Place, Suite 470, San Jose, California 95110, United States

Eyal Grubner

Nova Measuring Instruments, Ltd., P.O. Box 266, Weizmann Science Park, Rehovot 76100, Israel

Roy Koret

Nova Measuring Instruments, Ltd., P.O. Box 266, Weizmann Science Park, Rehovot 76100, Israel

Shay Wolfling

Nova Measuring Instruments, Ltd., P.O. Box 266, Weizmann Science Park, Rehovot 76100, Israel

J. Micro/Nanolith. MEMS MOEMS. 13(4), 041413 (Dec 08, 2014). doi:10.1117/1.JMM.13.4.041413
History: Received May 15, 2014; Accepted October 31, 2014
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Abstract.  Work using the concept of a co-optimization-based metrology hybridization is presented. Hybrid co-optimization involves the combination of data from two or more metrology tools such that the output of each tool is improved by the output of the other tool. Here, the image analysis parameters from a critical dimension scanning electron microscope (CD-SEM) are modulated by the profile information from optical critical dimension (OCD, or scatterometry), while the OCD-extracted profile is concurrently optimized through addition of the CD-SEM CD results. The test vehicle utilized is the 14-nm technology node-based FinFET high-k/interfacial layer (HK/IL) structure. When compared with the nonhybrid approach, the correlation to reference measurements of the HK layer thickness measurement using hybrid co-optimization resulted in an improvement in relative accuracy of about 40% and in R2 from 0.81 to 0.91. The measurement of the IL thickness also shows an improvement with hybrid co-optimization: better matching to the expected conditions as well as data that contain less noise.

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© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Alok Vaid ; Carmen Osorio ; Jamie Tsai ; Cornel Bozdog ; Matthew Sendelbach, et al.
"Hybrid metrology co-optimization of critical dimension scanning electron microscope and optical critical dimension", J. Micro/Nanolith. MEMS MOEMS. 13(4), 041413 (Dec 08, 2014). ; http://dx.doi.org/10.1117/1.JMM.13.4.041413


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