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Diffraction analysis of digital micromirror device in maskless photolithography system

[+] Author Affiliations
Zheng Xiong

Chinese Academy of Sciences, Changchun Institute of Optics, Fine Mechanics and Physics, Changchun 130033, China

University of Chinese Academy of Sciences, Beijing 130039, China

Hua Liu

Chinese Academy of Sciences, Changchun Institute of Optics, Fine Mechanics and Physics, Changchun 130033, China

Xiangquan Tan

Chinese Academy of Sciences, Changchun Institute of Optics, Fine Mechanics and Physics, Changchun 130033, China

Zhenwu Lu

Chinese Academy of Sciences, Changchun Institute of Optics, Fine Mechanics and Physics, Changchun 130033, China

Cuixia Li

Chinese Academy of Sciences, Changchun Institute of Optics, Fine Mechanics and Physics, Changchun 130033, China

University of Chinese Academy of Sciences, Beijing 130039, China

Liwei Song

Chinese Academy of Sciences, Changchun Institute of Optics, Fine Mechanics and Physics, Changchun 130033, China

Zhi Wang

Chinese Academy of Sciences, Changchun Institute of Optics, Fine Mechanics and Physics, Changchun 130033, China

J. Micro/Nanolith. MEMS MOEMS. 13(4), 043016 (Dec 16, 2014). doi:10.1117/1.JMM.13.4.043016
History: Received August 8, 2014; Accepted November 7, 2014
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Abstract.  A digital micromirror device (DMD) acts as a spatial light modulator in a maskless photolithography system. Illuminated by coherent light, DMD performs as a two-dimensional diffraction grating because of its periodical internal structure. Diffraction efficiency is an important factor for evaluating the exposure doses. A diffraction model of DMD based on Fourier analysis demonstrates that errors of the DMD’s manufacture and the precision of the machining of the optical mechanical structure affect the diffraction efficiency. Additionally, analysis of exposure results by the diffraction model of DMD in Tracepro explains the degradation of the exposure quality and is helpful for calibrating the direction of optical focusing.

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© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Zheng Xiong ; Hua Liu ; Xiangquan Tan ; Zhenwu Lu ; Cuixia Li, et al.
"Diffraction analysis of digital micromirror device in maskless photolithography system", J. Micro/Nanolith. MEMS MOEMS. 13(4), 043016 (Dec 16, 2014). ; http://dx.doi.org/10.1117/1.JMM.13.4.043016


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