Special Section on Holistic/Hybrid Metrology

Effect of measurement error budgets and hybrid metrology on qualification metrology sampling

[+] Author Affiliations
Matthew Sendelbach

Nova Measuring Instruments, Inc., 2055 Gateway Place, Suite 470, San Jose, California 95110, United States

Niv Sarig

Nova Measuring Instruments, Ltd., P.O. Box 266, Weizmann Science Park, Rehovot 76100, Israel

Koichi Wakamoto

Nova Measuring Instruments K.K., 1-7-11-403 Higashigotanda, Shinagawa, Tokyo 141-00222, Japan

Hyang Kyun (Helen) Kim

Nova Measuring Instruments, 93-2 Bansong-dong, Hwaseong-si, Kyeonggi-do 445-160, Republic of Korea

Paul Isbester

Nova Measuring Instruments, Inc., 2055 Gateway Place, Suite 470, San Jose, California 95110, United States

Masafumi Asano

Toshiba Corporation, 1, Komukai Toshiba-Cho, Saiwai-Ku, Kawasaki 212-8583, Japan

Kazuto Matsuki

Toshiba Corporation, 1, Komukai Toshiba-Cho, Saiwai-Ku, Kawasaki 212-8583, Japan

Carmen Osorio

GLOBALFOUNDRIES, 400 Stonebreak Road Extension, Malta, New York 12020, United States

Chas Archie

Nova Measuring Instruments, Inc., 2055 Gateway Place, Suite 470, San Jose, California 95110, United States

Nova Measuring Instruments, Ltd., P.O. Box 266, Weizmann Science Park, Rehovot 76100, Israel

Nova Measuring Instruments K.K., 1-7-11-403 Higashigotanda, Shinagawa, Tokyo 141-00222, Japan

Nova Measuring Instruments, 93-2 Bansong-dong, Hwaseong-si, Kyeonggi-do 445-160, Republic of Korea

Toshiba Corporation, 1, Komukai Toshiba-Cho, Saiwai-Ku, Kawasaki 212-8583, Japan

GLOBALFOUNDRIES, 400 Stonebreak Road Extension, Malta, New York 12020, United States

J. Micro/Nanolith. MEMS MOEMS. 13(4), 041414 (Dec 19, 2014). doi:10.1117/1.JMM.13.4.041414
History: Received May 16, 2014; Accepted October 31, 2014
Text Size: A A A

Abstract.  Until now, metrologists had no statistics-based method to determine the sampling needed for an experiment before the start that accuracy experiment. We show a solution to this problem called inverse total measurement uncertainty (TMU) analysis, by presenting statistically based equations that allow the user to estimate the needed sampling after providing appropriate inputs, allowing him to make important “risk versus reward” sampling, cost, and equipment decisions. Application examples using experimental data from scatterometry and critical dimension scanning electron microscope tools are used first to demonstrate how the inverse TMU analysis methodology can be used to make intelligent sampling decisions and then to reveal why low sampling can lead to unstable and misleading results. One model is developed that can help experimenters minimize sampling costs. A second cost model reveals the inadequacy of some current sampling practices—and the enormous costs associated with sampling that provides reasonable levels of certainty in the result. We introduce the strategies on how to manage and mitigate these costs and begin the discussion on how fabs are able to manufacture devices using minimal reference sampling when qualifying metrology steps. Finally, the relationship between inverse TMU analysis and hybrid metrology is explored.

© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Matthew Sendelbach ; Niv Sarig ; Koichi Wakamoto ; Hyang Kyun (Helen) Kim ; Paul Isbester, et al.
"Effect of measurement error budgets and hybrid metrology on qualification metrology sampling", J. Micro/Nanolith. MEMS MOEMS. 13(4), 041414 (Dec 19, 2014). ; http://dx.doi.org/10.1117/1.JMM.13.4.041414


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