Lithography

Epifluorescent direct-write photolithography for microfluidic applications

[+] Author Affiliations
MacCallister Higgins

University of Nevada, Department of Mechanical Engineering (312), 1664 North Virginia Street, Reno, Nevada 89557, United States

Emil J. Geiger

University of Nevada, Department of Mechanical Engineering (312), 1664 North Virginia Street, Reno, Nevada 89557, United States

J. Micro/Nanolith. MEMS MOEMS. 14(1), 013504 (Jan 29, 2015). doi:10.1117/1.JMM.14.1.013504
History: Received September 27, 2014; Accepted January 5, 2015
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Abstract.  We present a technique for fabricating soft-lithography molds created using an epifluorescent microscope. By focusing the UV light emitted from a Hg arc lamp, we demonstrate the ability to direct-write photoresist features with a minimum resolution of 45μm. This resolution is satisfactory for many microfluidic applications. A major advantage of this technique is its low cost, both in terms of capital investment and on-going expenditures. Furthermore, by using a motorized stage, we can quickly fabricate a design on demand, eliminating the need, cost, and lead-time required for a photomask. With the addition of an electronic shutter, complicated separate structures can be imaged and utilized to make a wide range of microfluidic devices. We demonstrate this technique using dry-film resist due to its low cost, ease of application, and less stringent safety protocols.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

MacCallister Higgins and Emil J. Geiger
"Epifluorescent direct-write photolithography for microfluidic applications", J. Micro/Nanolith. MEMS MOEMS. 14(1), 013504 (Jan 29, 2015). ; http://dx.doi.org/10.1117/1.JMM.14.1.013504


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