Lithography

Magnetic debris mitigation system for extreme ultraviolet sources

[+] Author Affiliations
Daniel T. Elg, John R. Sporre, Davide Curreli, Ivan A. Shchelkanov, David N. Ruzic

University of Illinois at Urbana-Champaign, Center for Plasma-Material Interactions, Department of Nuclear, Plasma, and Radiological Engineering, 216 Talbot Laboratory MC-234, 104 South Wright Street, Urbana, Illinois 61801, United States

Karl R. Umstadter

KLA-Tencor Corporation, 1 Technology Drive, Milpitas, California 95035, United States

J. Micro/Nanolith. MEMS MOEMS. 14(1), 013506 (Feb 09, 2015). doi:10.1117/1.JMM.14.1.013506
History: Received July 21, 2014; Accepted January 12, 2015
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Abstract.  In extreme ultraviolet (EUV) lithography, plasmas are used to generate EUV light. Unfortunately, these plasmas expel high-energy ions and neutrals which damage the collector optic used to collect and focus the EUV light. One of the main problems facing EUV source manufacturers is the necessity to mitigate this debris. A magnetic mitigation system to deflect ionic debris by use of a strong permanent magnet is proposed and investigated. A detailed computational model of magnetic mitigation is presented, and experimental results from an EUV source confirm both the correctness of the model and the viability of magnetic mitigation as a successful means of deflecting ionic debris.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Daniel T. Elg ; John R. Sporre ; Davide Curreli ; Ivan A. Shchelkanov ; David N. Ruzic, et al.
"Magnetic debris mitigation system for extreme ultraviolet sources", J. Micro/Nanolith. MEMS MOEMS. 14(1), 013506 (Feb 09, 2015). ; http://dx.doi.org/10.1117/1.JMM.14.1.013506


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