Special Section on Control of Integrated Circuit Patterning Variance Part 1: Metrology, Process Monitoring, and Control of Critical Dimension

Phase-sensitive structured illumination to detect nanosized asymmetries in silicon trenches

[+] Author Affiliations
Ahmad Faridian, Valeriano Ferreras Paz, Karsten Frenner, Giancarlo Pedrini, Wolfgang Osten

University of Stuttgart, Institut für Technische Optik and Stuttgart Research Center of Photonic Engineering, Pfaffenwaldring 9, Stuttgart 70569, Germany

Arie Den Boef

ASML, De Run 6501, 5504 DR, Veldhoven, The Netherlands

J. Micro/Nanolith. MEMS MOEMS. 14(2), 021104 (Apr 10, 2015). doi:10.1117/1.JMM.14.2.021104
History: Received July 15, 2014; Accepted March 16, 2015
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Abstract.  A metrology approach to detect nanoscale asymmetries in structures on a silicon wafer is being introduced through simulation investigations. The simulations were performed based on a rigorous coupled-wave analysis. A structured spot focused on the wafer with a high-numerical aperture (NA=0.7) has been scanned over the wafer. Having access to the complex amplitude of the wavefront over the field, both the intensity and the phase profile of the spot have been investigated in the far-field image plane. To show the proof of concept, we considered a 10-nm asymmetry that appears in the radius of the bottom roundings of a trench on the wafer. The results have been compared to the case of using a conventional spot and it has been shown that the structured illumination provides more sensitivity to the presence of asymmetry. In both illumination cases, the phase distribution along the spot was shown to be more sensitive to the changes due to the presence of asymmetry in the wafer.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Ahmad Faridian ; Valeriano Ferreras Paz ; Karsten Frenner ; Giancarlo Pedrini ; Arie Den Boef, et al.
"Phase-sensitive structured illumination to detect nanosized asymmetries in silicon trenches", J. Micro/Nanolith. MEMS MOEMS. 14(2), 021104 (Apr 10, 2015). ; http://dx.doi.org/10.1117/1.JMM.14.2.021104


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