Lithography

Gradient-based joint source polarization mask optimization for optical lithography

[+] Author Affiliations
Xu Ma, Lisong Dong, Chunying Han, Jie Gao, Yanqiu Li

Beijing Institute of Technology, School of Optoelectronics, Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, 5 South ZhongGuanCun Street, Beijing 100081, China

Gonzalo R. Arce

University of Delaware, Department of Electrical and Computer Engineering, Newark, Delaware 19716, United States

J. Micro/Nanolith. MEMS MOEMS. 14(2), 023504 (May 05, 2015). doi:10.1117/1.JMM.14.2.023504
History: Received November 11, 2014; Accepted April 7, 2015
Text Size: A A A

Abstract.  Source and mask optimization (SMO) has emerged as a key resolution enhancement technique for advanced optical lithography. Current SMO, however, keeps the polarization state fixed, thus limiting the degrees of freedom during the optimization procedure. To overcome this limitation, pixelated gradient-based joint source polarization mask optimization (SPMO) approaches, which effectively extend the solution space of the SMO problem by introducing polarization variables, are developed. First, the SPMO framework is formulated using an integrative and analytic vector imaging model that is capable of explicitly incorporating the polarization angles. Subsequently, two optimization methods, namely simultaneous SPMO (SISPMO) and sequential SPMO (SESPMO) are developed, both of which exploit gradient-based algorithms to solve for the optimization problem. In addition, a postprocessing method is applied to reduce the complexity of the optimized polarization angle pattern for improving its manufacturability. Illustrative simulations are presented to validate the effectiveness of the proposed algorithms. The simulations also demonstrate the superiority of the SESPMO over SISPMO in computational efficiency and improvement of image fidelity.

Figures in this Article
© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Xu Ma ; Lisong Dong ; Chunying Han ; Jie Gao ; Yanqiu Li, et al.
"Gradient-based joint source polarization mask optimization for optical lithography", J. Micro/Nanolith. MEMS MOEMS. 14(2), 023504 (May 05, 2015). ; http://dx.doi.org/10.1117/1.JMM.14.2.023504


Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.