Microelectromechanical Systems (MEMS)

Optimizing the response time of Ni-based resistive temperature detectors

[+] Author Affiliations
Deok Su Kim, Kyo Sang Choi, Hee Jun Yang, Min Soo Ryu, Ji Sung Chae, Sung Pil Chang

Inha University, Department of Electronic Engineering, 253 Younghyun-dong, Incheon 402-751, Republic of Korea

J. Micro/Nanolith. MEMS MOEMS. 14(2), 025002 (May 18, 2015). doi:10.1117/1.JMM.14.2.025002
History: Received February 4, 2015; Accepted April 17, 2015
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Abstract.  Resistive temperature detectors (RTDs) are widely used to monitor and control the temperature of work environments due to their higher sensitivity, excellent reliability and stability, and very linear output signal compared to other types of temperature detectors. However, RTDs have some shortcomings, including a slow response time. A nickel-based RTDs were designed, fabricated, and characterized in order to achieve faster response times. We used micromachining processes to analyze devices with different resistor thicknesses, distances between resistor lines, and resistor line widths. The response times of the RTDs were measured to be between 7.5104 and 23.4583 s. From these measurement data, we can conclude that thinner RTDs with larger surface areas show improved response times.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Deok Su Kim ; Kyo Sang Choi ; Hee Jun Yang ; Min Soo Ryu ; Ji Sung Chae, et al.
"Optimizing the response time of Ni-based resistive temperature detectors", J. Micro/Nanolith. MEMS MOEMS. 14(2), 025002 (May 18, 2015). ; http://dx.doi.org/10.1117/1.JMM.14.2.025002


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